Totai Co., Ltd.

Osaka University

Samsung Electronics Co., Ltd.

Ken Kokubo

Takeshi Noguchi

Akio Harada

Juichi Kasai

Eigo Miyazaki

Do Yoon Kim

Kenji Takai

Sang Eui Lee

A polishing slurry including a composite including a hydrophilic fullerene and an ionic compound, a method of manufacturing the same, and a method of manufacturing a semiconductor device.

Polishing slurry, method of manufacturing the same, and method of manufacturing semiconductor device

A hydroxylated-fullerene-containing solution in which a hydroxylated fullerene is evenly nano-dispersed in a solvent removable at low temperature in a subsequent step is provided. The hydroxylated-fullerene-containing solution includes a continuous phase including a mixed solvent consisting essentially of tetrahydrofuran and water or including melted phenol, and at least one of a hydroxylated fullerene and a hydroxylated fullerene derivative that is dispersed as a dispersed phase in the continuous phase, wherein the number-standard average particle diameter of particles in the dispersed phase is 50 nm or less. This solution is applied onto a surface of a resin molding, and then tetrahydrofuran and water, as the mixed solvent, are removed to form a hydroxylated fullerene layer on the surface of the resin molding. Alternatively, this solution is mingled with a resin, and then the mixed solvent is removed to produce a hydroxylated-fullerene-containing resin composition.

Hydroxylated-fullerene-containing solution, resin molding and resin composition each using the same, and method for producing each of the resin molding and the resin composition

Provided is a resin composition having excellent heat resistance by virtue of improved compatibility of a fullerene with a resin. Specifically, provided is a long-chain alkyl-etherified fullerene derivative, including: a fullerene skeleton formed of a spherical shell-shaped carbon molecule; and a long-chain alkyl group having 4 or more carbon atoms, which is bonded to the fullerene skeleton through an ether bond.

Long-chain alkyl-etherified fullerene derivative, production method for the same, and resin composition using the same

Provided are a novel fullerene derivative which can adsorb quickly and efficiently an allergen which may cause a pollen allergy without releasing the allergen again, does not contain a metal or the like which may cause a harmful effect to a human body, and is easily applicable, impregnable, or chemically bondable onto surface of various materials: and a process for producing the same. The fullerene derivative is characterized in that a halogen group and many hydroxyl groups are bonded directly to a fullerene nucleus. In the case that the halogen group is chlorine, the fullerene derivative can be synthesized by a partial hydroxylation of a chlorinated fullerene or a partial chlorination of a hydroxylated fullerene.

Partially halogenated, hydroxylated fullerene and allergen adsorbent using the same

Provided are a novel fullerene derivative which can adsorb quickly and efficiently an allergen which may cause a pollen allergy without releasing the allergen again, does not contain a metal or the like which may cause a harmful effect to a human body, and is easily applicable, impregnable, or chemically bondable onto surface of various materials; and a process for producing the same. The fullerene derivative is characterized in that a halogen group and many hydroxyl groups are bonded directly to a fullerene nucleus. In the case that the halogen group is chlorine, the fullerene derivative can be synthesized by a partial hydroxylation of a chlorinated fullerene or a partial chlorination of a hydroxylated fullerene.

Growing community of inventors

Suita, Japan

Ken Kokubo