Fujifilm Corporation

Ken-Ichi Umeda

Atsushi Tanaka

Kohei Higashi

Maki Nangu

A semiconductor device includes a substrate and a channel region which is formed above the substrate by printing, wherein a relationship L&#x2267;is satisfied where L is a channel length of the channel region and a is a minimum dimension among pattern dimensions and inter-pattern dimensions in the same layer as patterns that define the channel length L; and a relationship W&#x2267;is satisfied where W is a channel width of the channel region and b is a minimum dimension among pattern dimensions and inter-pattern dimensions in the same layer as a pattern that defines the channel width W.

Semiconductor device, manufacturing method of semiconductor device, and display device

A semiconductor device includes a substrate and a semiconductor layer having a channel region, the channel region is made from an oxide semiconductor which satisfies Vc/Va&#x3e;4 where Vc is a volume ratio of a crystalline component and Va is a volume ratio of a non-crystalline component.

Growing community of inventors

Ashigarakami-gun, Japan

Ken-Ichi Umeda