Tokyo Electron Limited

Ken Horiuchi

Takeshi Yokouchi

Shinichiro Hayasaka

Fumiko Yagi

Michishige Saito

Daiki Satoh

Shigeru Senzaki

Shingo Koiwa

Fumiko Yokouchi

Koji Ando

A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.

Gas supply method

A substrate processing apparatus includes: a first processing chamber; a second processing chamber; a transfer chamber; a frame structure; and an elevating part. Each of the first and the second processing chamber has a main body part and a lid part. The transfer chamber is connected to the first and the second processing chamber and accommodates a transfer unit for transferring the substrate. The frame structure has a pair of column parts and a beam part supported at top portions of the column parts. The elevating part is coupled to the beam part to be moved in a horizontal direction and moves the lid part in the vertical direction. The beam part extends above the first and the second processing chamber and the transfer chamber.

Substrate processing apparatus and maintenance method thereof

Gas supply system, substrate processing apparatus and gas supply method

Growing community of inventors

Nirasaki, Japan

Ken Horiuchi