Boe Technology Group Co., Ltd.

K-tronics (suzhou) Technology Co., Ltd.

Beijing Asahi Electronic Materials Co., Ltd

Kejun Lu

Teng Zhang

Guobin Qin

Fanhua Hu

Daeyoun Park

The present disclosure relates to a photoresist composition, a method for preparing the same, and a patterning method. The photoresist composition includes: 1 wt % to 10 wt % of a photosensitizer; 10 wt % to 20 wt % of a phenolic resin; 0.1 wt % to 5.5 wt % of an additive; and 75 wt % to 88 wt % of a solvent, based on the total weight of the photoresist composition, in which the photosensitizer includes: 20 wt % to 70 wt % of a first photosensitive compound represented by formula (1), 20 wt % to 70 wt % of a second photosensitive compound represented by formula (2), and 1 wt % to 35 wt % of a third photosensitive compound represented by formula (3), based on the total weight of the photosensitizer. The photoresist composition of the present disclosure simultaneously guarantees high resolution and high sensitivity, and can meet actual production requirements.

Photoresist composition, method for preparing the same, and patterning method

A lead-free sealing glass and a manufacture method thereof are provided. The lead-free sealing glass includes: 30 wt %-60 wt % of SiO, 10 wt %-30 wt % of BaO, 1 wt %-5 wt % of NaO, 1 wt %-10 wt % of KO, 2 wt %-10 wt % of VO, 5 wt %-10 wt % of CaO, 1 wt %-5 wt % of AlO, 0 wt %-5 wt % of BO, 1 wt %-3 wt % of FeO, and 0-5 wt % of alkaline earth metal oxide.

Lead-free sealing glass and manufacture method thereof

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Beijing, China

Kejun Lu