Intel Corporation

Asml Netherlands B.v.

Asml Holding N.v.

Keith William Andresen

Arie Jeffrey Den Boef

Harry Sewell

Michael Scott Goldstein

Sanjeev Kumar Singh

Earl William Ebert

A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.

Tunable wavelength illumination system

Scattered light is detected radiometrically in a photolithography system. A photodetector makes direct measurements of scatter at points in the line or plane of illumination, and a generalized scatter function is derived from these measured data.

Radiometric scatter monitor

Growing community of inventors

Wilton, CT, United States of America

Keith William Andresen