Air Products and Chemicals, Inc.

Keith R Fabregas

Diwakar Garg

Paul N Dyer

Leslie E Schaffer

Carl F Mueller

Ernest L Wrecsics

Madhukar Bhaskara Rao

Dnyanesh Chandrakant Tamboli

Gautam Banerjee

The present invention is a method of cleaning to removal residue in semiconductor manufacturing processing, comprising contacting a surface to be cleaned with an aqueous formulation having a polymer selected from the group consisting of acrylamido-methyl-propane sulfonate) polymers, acrylic acid-2-acrylamido-2-methylpropane sulfonic acid copolymer and mixtures thereof and a quaternary ammonium hydroxide having greater than 4 carbon atoms or choline hydroxide with a non-acetylinic surfactant. The present invention is also a post-CMP cleaning formulation having the components set forth in the method above.

Formulations and method for post-CMP cleaning

An improved highly erosive and abrasive wear resistant multi-layered coating system on a substrate which provides protection against impact of large particles is disclosed comprising a plurality of composite layers. In each of the composite layers, the first layer closest to the substrate comprises tungsten of sufficient thickness to confer substantial erosion and abrasion wear resistance characteristics to the coating system and a second layer deposited on the first layer comprises a mixture of tungsten and tungsten carbide and the tungsten carbide comprises W.sub.2 C, W.sub.3 C, or a mixture of both. Because the resulting coating system has enhanced high cycle fatigue strength over the substrate, the coating system is especially useful on such structures as turbine blades and similar articles of manufacture where such chemical vapor depositing the first and second layers at a temperature in the range of about 300.degree. to about 550.degree. C. and then repeating the chemical vapor deposition steps to achieve the multi-layered coating system such that the overall thickness of the system is at least about 20 .mu.m.

Low temperature chemical vapor deposition method for forming tungsten

An improved highly erosive and abrasive wear resistant multi-layered coating system on a substrate which provides protection against impact of large particles is disclosed comprising a plurality of composite layers. In each of the composite layers, the first layer closest to the substrate comprises tungsten of sufficient thickness to confer substantial erosion and abrasion wear resistance characteristics to the coating system and a second layer deposited on the first layer comprises a mixture of tungsten and tungsten carbide and the tungsten carbide comprises W.sub.2 C, W.sub.3 C, or a mixture of both. Because the resulting coating system has enhanced high cycle fatigue strength over the substrate, the coating system is especially useful on such structures as turbine blades and similar articles of manufacture where such high stress cycles occur during normal operation. Also dislcosed is the method for preparing such improved composite coating systems.

High erosion/wear resistant multi-layered coating system

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Easton, PA, United States of America

Keith R Fabregas