Olin Corporation

Keith O Wilbourn

Bruce A Marien

Murray A Ruggiero

James M Davidson

Richard W Roberts

Renata C Stegmeier

A process for reducing trace levels of metallic impurities in cyclized polyisoprene resin is disclosed. The process reduces trace levels of metallic impurities in cyclized polyisoprene resin by washing an impure organic solvent/cyclized polyisoprene resin solution at least once with a heated aqueous acidic solution, and subsequently washing the resin at least once with heated water.

Process for reducing trace levels of metallic impurities in cyclized

A process of making poly(dianhydride) compounds having formulae (I) and (II): ##STR1## where m is 0 to 50. ##STR2## wherein n is 0 to 20 and X is bond junction, oxygen atom, sulfur atom, SO.sub.2, C(CF.sub.3), CO, C(CH.sub.3).sub.2, CF.sub.2 --O--CF.sub.2, CH.sub.2, and CHOH.

Process of making selected poly(dianhydrides) compounds

Poly(dianhydride) compounds having formulae (I) and (II): ##STR1## where m is 0 to 50. ##STR2## wherein n is 0 to 20 and X is bond junction, oxygen atom, sulfur atom, SO.sub.2, C(CF.sub.3), CO, C(CH.sub.3).sub.2, CF.sub.2 --O--CF.sub.2, CH.sub.2, and CHOH.

Selected poly(dianhydride) compounds terminated with reactive end groups

Selected poly(dianhydrides) compounds, selected poly(amic acid)

Poly(dianhydride) compounds having formulae (I) and (II): ##STR1## where m is 0 to 50. ##STR2## wherein n is 0 to 20 and X is bond junction, oxygen atom, sulfur atom, SO.sub.2, C(CF.sub.3), CO, C(CH.sub.3).sub.2, CF.sub.1 --O--CF.sub.2, CH.sub.2, and CHOH. The compounds are intermediates for certain resins.

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Manchester, CT, United States of America

Keith O Wilbourn