Ovonic Synthetic Materials Company Inc.

Keith L Hart

James L Wood

John E Keem

Stanford R Ovshinsky

Steven A Flessa

Lennard Sztaba

Benjamin S Chao

Purnachandra Pai

Nicola J Grupido

Yasuo Takagi

X-ray dispersive and reflective structures and materials are constructed which exhibit improved characteristics in specific ranges of interest. The structures are formed of metallic and non-metallic layer pairs. The structures are formed of alternating layers of Cr:C, Ni:C or V:C for carbon analysis and Mo:B.sub.4 C for beryllium an boron analysis. The layered structures can be formed from Ni:C for analysis of both carbon and boron.

Reflectivity and resolution X-ray dispersive and reflective structures

A coated stainless steel article and a method of preparing the article are disclosed. The coating is a plasma chemical vapor deposited coating, formed from a plasma of nitrous oxide, a silane, and an energy transfer agent (such as He, Ar). The resulting coating is adherent, corrosion resistant, and has a thickness sufficient to mask and cover the features of the stainless steel substrate, and to provide a pitting potential (in 3.5% NaCl) of greater than 600 millivolts, a J.I.S. 8502 (1982) versus a saturated calomel electrode a salt spray test rating in 5% NaCl-0.02% hydrogen peroxide of at least B.

Plasma chemical vapor deposition SiO.sub.2-x coated articles and plasma

X-ray dispersive and reflective structures and materials are provided which exhibit at least one third of the theoretical integral reflection coefficient for the structures in the range of interest without fluorescence or absorption edges. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.

X-ray dispersive and reflective structures

X-ray dispersive and reflective structures and materials are provided which exhibit improved resolution and reflectivity in specific ranges of interest without substantial fluorescence or absorption edges. The structures are formed of metallic and non-metallic layer pairs and can include a buffer layer between each layer to prevent interdiffusion to stabilize the structures. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.

X-ray dispersive and reflective structures and method of making the

Multiple wavelength X-ray dispersive devices and method of forming them are provided which reflect at least two wavelengths of interest at the same or different angles. The devices include a plurality of layer sets formed on one another, each set having at least two units. At least one unit includes at least two layers having a first d spacing and the second unit has at least one layer with a second d spacing. A plurality of one or both of the units can also be provided in each layer set.

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Flat Rock, MI, United States of America

Keith L Hart