Applied Materials, Inc.

Keith D Relleen

John Ruffell

Tristan Richard Holtam

Robert J C Mitchell

Theodore H Smick

Ronald Horner

John Gordon

Robert J Mitchell

Robert John Clifford Mitchell

Justin Lowe

Robert JCS Mitchell

Robert JCS Southwood Mitchell

A scanning arm assembly for multi-directional mechanical scanning of a semiconductor wafer or other substrate to be implanted includes a pair of drive arms connected by two linkage arms to form a quadrilateral. Rotary joints are provided to join adjacent arms together, and a substrate holder is provided on one linkage arm where it joins the other linkage arm. Thus, rotating the drive arms causes the substrate holder to move. Suitable control of the drive arms allows the substrate holder to be moved through an ion beam to follow many different paths and hence implant patterns.

Multi-directional mechanical scanning in an ion implanter

A substrate holding apparatus for use in ion implanters includes two or more substrate holders that can adopt interchangeable positions, thereby allowing one substrate holder to scan a substrate through an ion beam while substrates can be swapped on the other substrate holder. The substrate holder assembly includes a base rotatable about a first axis and at least two support arms extending from the base to ends provided with substrate holders. Rotating the base allows the substrate holders to move between designated positions. One designated position may correspond to a position for implanting a substrate and another designated position may correspond to a loading/unloading station.

Substrate holding apparatus

An ion implanter incorporates an r.f. accelerator assembly to provide ions for implant at high energies. The accelerator assembly includes electrodes mounted in the vacuum chamber so as to be movable between an operational position for generating and accelerating electric field and a non operational position within the vacuum chamber displaced clear of the beam path. An Actuator moves the electrode between the operational and non operation positions. For energy implanting, the electrodes are in the operational position and for low energy implants the actuator moves the electrodes to the non operational position clear of the beam path.

Ion implanter and a method of implanting ions

An apparatus for processing wafers one at a time. The apparatus has a vacuum chamber into which wafers are loaded through a pair of loadlocks which are spaced one above the other. A robot within the vacuum chamber has a pair of gripper arms which are moveable along and rotatable about a vertical axis so as to be moveable between the loadlocks and a wafer processing position. Each of the loadlocks has a vertically moveable portion which is moveable away from the remainder of the loadlock to provide access in a horizontal plane for one of the gripper arms

Method and apparatus for processing wafers

An ion implanter having a scanning arm which can pass vertically through ion beam, having a wafer loading/unloading position above the beam. The scanning arm also has capability for movement of wafer in its own plane when tilted relative to the beam, and there is also disclosure of a double scanning arm arrangement generating to/from a single wafer loader/unloader.

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West Sussex, United Kingdom

Keith D Relleen