Renesas Electronics Corporation

Keita Tsuchiya

Shuuichi Kariyazaki

Kazuyuki Nakagawa

Yoshiaki Sato

Yutaka Uematsu

Shinji Baba

Norio Chujo

Masayoshi Yagyu

Wataru Shiroi

Shinji Katayama

Hiroyuki Uchida

Michiaki Sugiyama

Takashi Kikuchi

Nobuhiro Kinoshita

Kazuhiro Mitamura

Yuji Kayashima

Katsushi Terajima

Yusuke Tanuma

Yosuke Katsura

Yoshitaka Okayasu

A wiring substrate includes: a first insulating layer; a ground plane formed on the first insulating layer; a second insulating layer formed on the first insulating layer such that the ground plane is covered with the second insulating layer; a first signal wiring formed on the second insulating layer; a third insulating layer formed on the second insulating layer such that the first signal wiring is covered with the third insulating layer; and a second signal wiring formed on the third insulating layer and electrically connected with the first signal wiring. The first signal wiring is arranged in a region overlapping with a portion of a heat radiating plate. The second signal wiring is not arranged in the region. The ground plane has an opening portion located at a position overlapping with the first signal wiring. The opening portion is formed so as to extend along the first signal wiring.

Semiconductor device including wiring substrate having multiple signal wirings and multiple insulating layers

A wiring substrate includes: a first insulating layer; a first metal pattern formed on the first insulating layer; a second insulating layer formed on the first insulating layer so as to cover the first metal pattern; a second metal pattern formed on the second insulating layer; and an organic insulating film contacted with a portion of the second metal pattern. The first metal pattern has: a first lower surface contacted with the first insulating layer; and a first upper surface contacted with the second insulating layer. The second metal pattern has: a second lower surface contacted with the second insulating layer; and a second upper surface contacted with the organic insulating film. Further, a surface roughness of the second upper surface is larger than a surface roughness of each of the second lower surface, the first upper surface and the first lower surface.

Semiconductor device

A semiconductor device includes a wiring substrate having: a first wiring layer having pads; and a second wiring layer having wirings and via-lands. The via-lands include: first-row via-lands connected to first-row pads of the pads, respectively; and second-row via-lands connected to the second-row pads of the pads, respectively. In the perspective plan view, the first-row via-lands have: first via-lands arranged such that a center of each of the first via-lands is shifted in a direction away from a first side of the semiconductor chip than a position overlapping with a center of the corresponding first-row pad; and second via-lands arranged such that a center of each of the second via-lands arranged at a position closer to the first side than the first via-land. In the perspective plan view, the first and second via-lands are alternately arranged in a first direction along the first side.

Semiconductor device having wiring substrate with lead-out wirings

The semiconductor device includes a wiring substrate, a first and second semiconductor chips, and the heat sink. The wiring substrate has a first surface. The first and second semiconductor chips are disposed on the first surface. The heat sink is disposed on the first surface so as to cover the first semiconductor chip. The heat sink has a second surface and the third surface opposite the first surface. The second surface faces the first surface. The heat sink has a first cut-out portion. The first cut-out portion is formed at a position overlapping with the second semiconductor chip in plan view, and penetrates the heat sink in a direction from the third surface toward the second surface. The second surface is joined to at least four corners of the first surface.

Performance of a semiconductor device is improved. The semiconductor device includes a semiconductor chip and a chip component that are electrically connected to each other via a wiring substrate. The semiconductor chip includes an input/output circuit and an electrode pad electrically connected to the input/output circuit and transmitting the signal. The chip component includes a plurality of types of passive elements and includes an equalizer circuit for correcting signal waveforms of the signal, and electrodes electrically connected to the equalizer circuit. The path length from the signal electrode of the semiconductor chip to the electrode of the chip component is 1/16 or more and 3.5/16 or less with respect to the wavelength of the signal.

A semiconductor device has a wiring substrate on which a semiconductor chip is mounted. A wiring layer of the wiring substrate has a wiring. This wiring has a main wiring unit extending in a direction 'X' and a plurality of sub-wiring units extending in a direction 'Y', in a cross sectional view, and is supplied with a power source potential. The wiring layer has a wiring. This wiring has a main wiring unit extending in the direction &#x201c;X&#x201d; and a plurality of sub-wiring units extending in the direction &#x201c;Y&#x201d;, in a cross sectional view, and is supplied with a reference potential. The sub-wiring units and the sub-wiring units have end units and end units on a side opposed to the end units, and are alternately arranged along the direction &#x201c;X&#x201d; between the main wiring units. To the end units, via wirings are coupled.

High speed semiconductor device with noise reduction wiring pattern

A semiconductor device includes a semiconductor chip including a first circuit and a wiring substrate over which the semiconductor chip is mounted. The wiring substrate includes input signal wires transmitting an input signal to the semiconductor chip, output signal wires transmitting an output signal from the semiconductor chip, and first conductor planes supplied with a reference potential. When a wire cross-sectional area is defined as the cross-sectional area of each wire in a direction orthogonal to a direction in which the wire extends, the wire cross-sectional area of each input signal wire is smaller than the wire cross-sectional area of each output signal wire. In the thickness direction of the wiring substrate, each input signal wire is interposed between second conductor planes and third conductor planes each supplied with the reference potential. Between the output signal wires and the input signal wires, the third conductor planes are disposed.

A semiconductor device includes a semiconductor chip mounted over a wiring substrate. A signal wiring for input for transmitting input signals to the semiconductor chip and a signal wiring for output for transmitting output signals from the semiconductor chip are placed in different wiring layers in the wiring substrate and overlap with each other. In the direction of thickness of the wiring substrate, each of the signal wirings is sandwiched between conductor planes supplied with reference potential. In the front surface of the semiconductor chip, a signal electrode for input and a signal electrode for output are disposed in different rows. In cases where the signal wiring for output is located in a layer higher than the signal wiring for input in the wiring substrate, the signal electrode for output is placed in a row closer to the outer edge of the front surface than the signal electrode for input.

A semiconductor device includes a wiring substrate including a first surface and a second surface opposite to the first surface, a semiconductor chip including a plurality of chip electrodes and mounted over the wiring substrate, a first capacitor arranged at a position overlapping with the semiconductor chip in plan view and incorporated in the wiring substrate, and a second capacitor arranged between the first capacitor and a peripheral portion of the wiring substrate in plan view. Also, the second capacitor is inserted in series connection into a signal transmission path through which an electric signal is input to or output from the semiconductor chip.

According to an embodiment of the present invention, there is provided a semiconductor device having a first semiconductor component and a second semiconductor component which are mounted on a wiring substrate. The first semiconductor component has a first terminal for transmitting a first signal between the first semiconductor component and the outside and a second terminal for transmitting a second signal between the first semiconductor component and the second semiconductor component. In addition, the second semiconductor component has a third terminal for transmitting the second signal between the second semiconductor component and the first semiconductor component. Further, the first signal is transmitted at a higher frequency than the second signal. Furthermore, the second terminal of the first semiconductor component and the third terminal of the second semiconductor component are electrically connected to each other via the first wiring member. In addition, the first terminal of the first semiconductor component is electrically connected to the wiring substrate via a first bump electrode without the first wiring member interposed therebetween.

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Tokyo, Japan

Keita Tsuchiya