Kabushiki Kaisha Toshiba

Toshiba Electronic Devices & Storage Corporation

Keita Masuda

Kazuya Nishihori

Mitsutoshi Nakamura

Masami Nagaoka

Atsushi Ishimaru

Takahiro Nakagawa

Tooru Suga

Kazuhiko Shibata

A semiconductor device includes an insulating layer, a semiconductor layer on the insulating layer, and a control electrode on the semiconductor layer. The semiconductor layer includes first and second semiconductor parts and a separation trench between the first and second semiconductor parts. The first and second semiconductor parts extending along the insulating film. The first semiconductor part includes first and second regions of a first conductivity type, and a fifth region of a second conductivity type between the first and second regions. The second semiconductor part includes third and fourth regions of the second conductivity type, and a sixth region of the second conductivity type between the third and fourth regions. The control electrode extends over the fifth and sixth regions. The semiconductor layer further including a seventh region of the second conductivity type at a bottom of the separation trench and electrically connecting the fifth and sixth regions.

Semiconductor device having semiconductor region at bottom of separation trench and connecting two semiconductor regions over which control electrode extends

A high frequency transistor includes a first semiconductor layer, a first insulating film and a control electrode. The first semiconductor layer on the first insulating film extends in a first direction along an upper surface of the first insulating film. The first semiconductor layer has a first layer thickness in a second direction perpendicular to the upper surface, and a first width in a third direction orthogonal to the first direction. The first width is greater than the first layer thickness. The control electrode covers upper and side surfaces of the first semiconductor layer. The first semiconductor layer includes a first region of a first conductivity type, second and third regions of a second conductivity type. The first to third regions are arranged in the first direction. The first region is provided between the second and third region. The control electrode covers the first region.

High frequency transistor

A radio frequency switch includes a switch circuit having switchable radio frequency (RF) signal pathways. Each switchable RF signal pathway comprises a plurality of n-type MOSFETs connected in series. A control circuit is configured to control a conduction state of the plurality of switchable RF signal pathways. Each n-type MOSFET includes a body region between a source region thereof and a drain region thereof. A gate electrode is on the body region. A silicon nitride film having a tensile internal stress covers the source layer, the drain layer, and the gate electrode.

Semiconductor switch

According to one embodiment, a semiconductor switch circuit includes a semiconductor substrate, an insulating film, a semiconductor layer, a first wiring line, a semiconductor switch unit, and a first conductor. The insulating film is provided on the semiconductor substrate. The semiconductor layer is provided on the insulating film. The first wiring line is provided above the insulating film. The semiconductor switch unit is provided on the semiconductor layer and is electrically connected to the first wiring line. The first conductor is provided between the first wiring line and the semiconductor substrate.

Growing community of inventors

Kawasaki Kanagawa, Japan

Keita Masuda