Ebara Corporation

Sony Corporation

Japan Atomic Energy Research Institute

Ebara Manufacturing Co., Ltd.

Nkk Corporation

Shin Nippon Seitetsu Kabushiki Kaisha

Keita Kawamura

Sueo Machi

Shinji Aoki

Shingo Aso

Waichiro Kawakami

Shoji Hashimoto

Shingi Aoki

Hitoshi Kimura

Tsutomu Katayama

Ryoji Suzuki

Hiroshi Yoshida

Hideaki Okubo

Tsutomu Higo

Toshifumi Nishiura

Yasuhiro Sawada

Hiroaki Yamazoe

Okihiro Tokunaga

Shoichi Sato

Katsumi Kengaku

Tsuneharu Miyachi

Shinichi Hirano

Masao Taniguchi

Yasushi Aoki

Chikara Kaido

Shouichi Suda

Yokichi Shibamura

Toru Agarida

A flash memory device includes a flash memory unit; and a control unit configured to perform control so that data having a size smaller than a block size of the flash memory unit is sequentially written to the flash memory unit.

Flash memory device, memory control device, memory control method, and storage system

A storage apparatus includes: a memory allowing an operation to be carried out in order to additionally write new write data into a storage area already used for storing previous write data so as to store the new data in the storage area along with the previous write data; an input/output section configured to receive write data in a write access; and a control section configured to write the write data into the memory on the basis of the write access, wherein, in internal processing based on the write access, the control section carries out an additional-write operation for a storage area already used for storing the previous write data in the internal processing.

Storage apparatus and storage system

A storage apparatus includes: an input/output section configured to input and output data related to an external access; a memory for storing input data input by the input/output section by distributing the input data to a plurality of areas while making use of a cache area for temporarily storing the input data; and a control section configured to make an access to the memory on the basis of the external access and carry out a garbage collection operation on the areas including the cache area in order to release the cache area in the access made to the memory on the basis of the external access.

A method of removing harmful gas from a refuse combustion exhaust gas. The refuse combustion exhaust gas, containing a harmful gas such as hydrogen chloride, is supplied to a reactor. Other steps include atomizing an alkaline material within the reactor, and applying radiation, such as an electron beam, to the refuse combustion exhaust gas, simultaneously with the atomizing of the alkaline material, thereby causing a reaction between the gas and the alkaline material, and recovering a salt produced by the reaction.

Method for removing harmful gas from refuse combustion exhaust gas

In an exhaust gas treatment process, the exhaust gas is first irradiated in the presence of ammonia to produce particulates, and is then fed into an electrostatic precipitator and then to a mechanical filter device, whereby the treated effluent gas released into the atmosphere is caused to satisfy the relevant dust regulation values in addition to being substantially free of SO.sub.x and NO.sub.x.

Exhaust gas treatment process using irradiation

There is disclosed an improved method of treating waste gas by electron irradiation with ammonia being added to the waste gas, characterized in that the reaction temperature is held between 50.degree. C. and 80.degree. C. during the treatment.

Method of treating waste gas by irradiation

A method of detecting a broken foil that closes the opening of the window of the reaction vessel of an apparatus for treating waste gas with irradiation is disclosed. The detection is accomplished by monitoring a change in the window cooling gas.

Method of detecting broken window foil of apparatus for treating waste

Removal of gaseous pollutants such as nitrogen oxides and sulfur dioxide from effluent gases can be carried out advantageously from an industrial viewpoint by effecting irradiation of said gases under specifically selected conditions. High dose rate electron beam irradiation at a dose rate in the region of 10.sup.5 rad/sec or higher is, unexpectedly, remarkably effective and efficient for said purpose. Irradiation under increased pressure is also preferable. Wash of gases after irradiation or effecting irradiation in the presence of water vapor is effective especially for the removal of nitrogen oxides. Further, by carrying out the process in two-steps in which nitrogen oxides are removed from such gases almost completely by irradiation with the minimum dose of electron beams before sulfur dioxide is removed from the thus treated gases by conventional desulfurization means, the process can be carried out very economically. Thus, it has become industrially feasible to treat the effluent gases with irradiation, for the removal of nitrogen oxides and sulfur dioxide before releasing them into the atmosphere.

Process for removing nitrogen oxides and sulfur dioxide from effluent

Effluent gas containing SO.sub.2 and/or nitrogen oxides of various forms (referred to as NO.sub.x) are irradiated with an ionizing radiation to form aerosol. The aerosol is collected by a collecting means to form a collected material containing sulfur dioxide and nitrogen oxides. Effective components are recovered from the collected material by subjecting it either to steam-roasting with or without addition of ore of low grade, solid waste generated from smelting processes, copper-containing pyrite cinders or an alkali earth metal compound to the collected material, or to thermal decomposition.

Process for utilizing collected material removed from effluent gas

Growing community of inventors

Kanagawa, Japan

Keita Kawamura