Brother Kogyo Kabushiki-Kaisha

Nifco Inc.

Hayashi Telempu Co., Ltd.

Covalent Materials Corporation

Keisuke Watanabe

Naofumi Yagame

Toshiya Nishiura

Yoshihiro Tsuchimoto

Keiji Morita

Sachiyuki Nagasaka

The present invention discloses a winding device that includes a screen, a shaft portion to which one end of the screen is fastened, a rotary shaft member that fits to an end portion of the shaft portion so that the rotary shaft member is rotated around a rotation axis along an axial direction of the shaft portion, and a biasing portion that biases the rotary shaft member in a rotation direction for winding the screen. A relative rotation restriction structure and a movement restriction structure are formed on a fitting portion between the shaft portion and the rotary shaft member. The relative rotation restriction structure restricts a relative rotation of the shaft portion with respect to the rotary shaft member. The movement restriction structure restricts a movement of the shaft portion in the axial direction with respect to the rotary shaft member.

Winding device

The present invention discloses a shading device includes a screen, a shaft portion having a lock portion to be locked, a biasing mechanism, a locking member that is engaged at a lock position with the lock portion, and a housing in which the end portion of the shaft portion is inserted. The housing has a sliding guide portion in which the locking member is slid. The sliding guide portion is capable of guiding the locking member in a direction passing through the lock position and a lock release position, and has a lock position engagement portion for stopping the locking member from sliding at the lock position. The locking member includes a slide engagement portion that engages with the lock position engagement portion at the lock position and an operating portion that can be flexed to release the slide engagement portion from the lock position engagement portion.

Shading device

An image forming apparatus includes an image forming portion, a first side frame and a second side frame facing each other and supporting a part of the image forming portion, a lower frame connecting the first side frame and the second side frame below the image forming portion, a lower voltage power supply board including a low voltage circuit configured to lower a voltage from an external power supply to a specified voltage and supply the specified voltage to other units, and a cover. The lower frame has an upper surface facing upward and includes a plurality of fixing portions. The low voltage power supply board is fixed to the fixing portions of the lower frame. The cover covers the lower voltage power supply board on a side thereof opposite to the lower frame.

Image forming apparatus with low voltage power supply board and frame

An image forming device includes a main body, an image forming unit configured to be attached to and detached from the main body, the image forming unit being configured to move among first, second, and third positions, a shaft member configured to rotate around an axis line thereof between a first rotational position and a second rotational position, a first regulator provided to the shaft member so as to, when the shaft member is in the first rotational position, engage with the image forming unit and forbid the image forming unit to move between the second position and the third position, and a second regulator provided to the shaft member so as to, when the shaft member is in the second rotational position, engage with the image forming unit and forbid the image forming unit to move between the first position and the second position.

Image forming device including a shaft member with regulators provided thereon for breaking up an attachment/detachment operation of an image forming unit

To provide a yttria sintered body having an excellent corrosion resistance to halogen-based corrosive gases and plasma and an excellent thermal shock resistance, and adapted for use as a component member in manufacturing apparatuses for semiconductor and liquid crystal devices, particularly in a plasma process apparatus. A yttria sintered body including tungsten of an average particle size of 3 &#x3bc;m or less dispersed in the yttria so that a ratio of the tungsten relative to the yttria is ranging from 1 to 50% in terms of weight, and having an open pore rate of 0.2% or less and a thermal shock resistance by water submersion method of 200&#xb0; C. or larger.

Growing community of inventors

Aichi, Japan

Keisuke Watanabe