Hitachi High-tech Corporation

Keisuke Tanuma

Yusuke Seki

Mitsuhiro Nakamura

Takumi Uezono

Masato Kamio

Hironori Itabashi

Hiroki Kannami

It is aimed to properly correct the various types of distortion without a reduction in observation throughput. The present disclosure provides a charged particle beam device that obtains an image by irradiating a specimen with a charged particle beam and includes: a deflection coil that scans the charged particle beam on the specimen; a D/A converter that converts a digital scan waveform into an analog scan waveform and outputs the analog scan waveform to the deflection coil to drive the deflection coil; and a scan waveform generation unit that generates a digital scan waveform and outputs the digital scan waveform to the D/A converter, in which the scan waveform generation unit has a basic LUT that stores parameters for correcting the digital scan waveform and includes a correction circuit that corrects a distortion characteristic of the deflection coil.

Charged particle beam device and scan waveform generation method

A dielectric microscopic observation is possible, which suppresses image flow regardless of scanning speed. There are provided a sample chamberholding a samplebetween a first insulating layeron which a conductive layerto be irradiated with a charged particle beam is laminated and a second insulating layer, an amplifierthat amplifies a potential change that occurs at an interface between the first insulating layer and the sample as the conductive layer is irradiated with the charged particle beam, and outputs the amplified result as a measurement signal, a main control unitthat converts the measurement signal from the amplifier into image data, and corrects the image data with a deconvolution filterto generate corrected image data, a display unitincluding an observation image display unitand a filter adjustment unitthat displays setting information of the deconvolution filter, and an information processing device that displays the corrected image data on the observation image display unit, and when the setting information of the deconvolution filter displayed in the filter adjustment unit is changed, adjusts the deconvolution filter according to the changed setting information.

Charged particle beam device and sample observation method

Growing community of inventors

Tokyo, Japan

Keisuke Tanuma