Nissan Chemical Industries Limited

Nissan Chemical Corporation

Keisuke Shuto

Taku Kato

Masayoshi Suzuki

Junpei Kobayashi

Takehiro Nagasawa

Kenji Takase

Kei Yasui

Kentaro Ohmori

A polymerizable composition includes 100 parts by mass of a reactive polysiloxane being a polycondensation product of an alkoxy silicon compound including at least an alkoxy silicon compound of formula [1], and 10 to 500 parts by mass of a polymerizable compound having at least one polymerizable double bond. (X is a phenyl group having at least one substituent having a polymerizable double bond, a naphthyl group having at least one substituent having a polymerizable double bond, a biphenyl group having at least one substituent having a polymerizable double bond, or a phenanthryl group having at least one substituent having a polymerizable double bond, Aris a condensed ring hydrocarbon group having two or more benzene ring structures, or a hydrocarbon ring assembly group in which two or more aromatic rings are directly bonded through a single bond, and Ris methyl group, ethyl group, or isopropyl group).

Reactive polysiloxane and polymerizable composition comprising same

A polymerizable silane compound that yields a cured product exhibiting a high refractive index and a low Abbe number, used in a polymerizable composition for preparing a molded article having higher transparency. A polysiloxane being a polycondensation product of the compound of formula [1]: (wherein X is a phenyl group having at least one substituent having a polymerizable double bond, a naphthyl group having at least one substituent having a polymerizable double bond, a biphenyl group having at least one substituent having a polymerizable double bond, or a phenanthryl group having at least one group having a polymerizable double bond, Aris a condensed polycyclic hydrocarbon group (optionally substituted with a Calkyl group), or a hydrocarbon ring assembly group wherein two or more aromatic rings are directly bonded through a single bond (optionally substituted with a Calkyl group), and Ris a methyl, ethyl, or isopropyl group).

Polymerizable silane compound

A polymerizable composition which can be cured into a cured product exhibiting a low Abbe's number and is suitable for producing a molded article having a further high transparency. A polymerizable composition including 100 parts by mass of a reactive silsesquioxane compound containing a phenanthrene ring (a), and 10 to 500 parts by mass of a polymerizable compound having at least one polymerizable double bond (b), a cured product of the polymerizable composition, and a method for producing a molded article by using of the polymerizable composition.

Polymerizable composition containing reactive silsesquioxane compound containing phenanthrene ring

There is provided a polymerizable composition suitable to produce a molded product in which high refractive index is maintained, and dimensional change and a transmittance change further caused by a high-temperature heat history can be suppressed. A polymerizable composition comprising (a) 100 parts by mass of a specific reactive silsesquioxane compound and (b) 10 to 2,000 parts by mass of a specific fluorene compound, and a cured product obtained by curing the polymerizable composition, and a resin lens manufactured from the polymerizable composition.

Polymerizable composition comprising silsesquioxane compound having acrylic group

A polymerizable composition suitable for producing a molded article that can maintain a high refractive index and a low Abbe's number and can be restrained from dimensional changes due to a high-temperature thermal history has (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of a specific fluorene compound and (c) 1 to 100 parts by mass of a specific aromatic vinyl compound. A cured product can be obtained by curing the polymerizable composition.

Polymerizable composition comprising reactive silsesquioxane compound and aromatic vinyl compound

A imprint material is provided, and a film that is prepared from the material and to which the pattern is transferred. An imprint material including: (A), (B), (C) and (D) components; a ratio of the amount of the (B) component to a total amount of the (A) component and the (B) component of 100% by mass is 5% by mass or more and 25% by mass or less: (A) a silsesquioxane compound having a repeating unit of Formula (1) and having two or more polymerizable groups of Xin Formula (1); (B) a silicone compound having a repeating unit of Formula (2) and having two polymerizable groups at ends thereof; (C) a photopolymerization initiator; and (D) a solvent wherein the formulae, Rand Rare each independently a Calkyl group; Ris a Calkylene group; and k is an integer of 0 to 3.

Imprint material containing silsesquioxane compound and modified silicone compound

A novel imprint material and film produced from the material, on which a pattern is transferred. An imprint material having: a component (A); a component (B); a component (C); and a component (D), wherein, (A): a compound of Formula (1), Formula (2), or Formula (3): wherein, X is Clinear alkylene, Ris H or CH; each of R, R, and Ris independently H, CH, or CH; and the sum of the number of carbon atoms on R, R, and Ris 0 to 2; (B): a silsesquioxane compound having a repeating unit of Formula (4), and having two or more polymerizable groups of Y; (C): a silicone compound having a repeating unit of Formula (5), and having two polymerizable groups on its ends: wherein, each of Rand Ris independently Calkyl; Ris Calkylene; and k is 0 to 3; and (D): photopolymerization initiator.

Imprint material

A sealing material composition for LED has excellent heat-resistant transparency, adhesion, and crack resistance, and low sulfur gas permeability. A sealing material composition for LED has the following (A), (B), (C), and (D): (A): polysiloxane containing units (1-1), (1-2), and (1-3): wherein Ris Calkyl or Caryl, Ris hydrogen, Calkyl, or Si constituting main chain of polysiloxane as (A); (B): polysiloxane containing units (2-1), (2-2), and (2-3): wherein Rand Rare each hydrogen, Calkyl, or Si constituting main chain of polysiloxane as (B); (C): adhesive; and (D): condensation catalyst for silanol group.

Sealing material composition for LED

An imprint material which is in a transparent and homogeneous varnish form, is not peeled off in cross-cut tests, in which the adhesion of coating films is evaluated, and forms films that can have a mold release force of 0.5 g/cm or less. An imprint material including: a component (A): a compound containing at least one alkylene oxide unit having carbon atom number of 2, 3 or 4 and at least two polymerizable groups; a component (B): a photopolymerization initiator; a component (C): a solvent that swells or dissolves a surface portion of a film base material to which the imprint material is applied; and a component (D): a silicone compound.

There is provided an imprint material that allows a resin film to be readily released from a mold at the time of mold release after curing, that is, an imprint material that forms a film having a low mold release property as well as high transparency, high scratch resistance, and a high fingerprint wiping-off property; and a film which is formed from the material and to which a pattern is transferred. An imprint material including: a (A) component: a compound having a propylene oxide unit and two polymerizable groups or a compound having a propylene oxide unit, an ethylene oxide unit, and two polymerizable groups; a (B) component: a silicone compound; and a (C) component: a photopolymerization initiator.

Imprint material having low mold release property

There is provided a planarizing film-forming composition for a hard disk. A planarizing film-forming composition for a hard disk comprising a hydrophobic coating material having a photopolymerizable group and an aromatic group, containing a polymer or a combination of a polymer and a compound selected from the group consisting of a polymer (A1) including an aromatic group, having a molecular weight of 300 to 5000, and being a liquid at normal temperature under atmospheric pressure, a polymer (A2) including at least two photopolymerizable groups, having a molecular weight of 300 to 5000, and being a liquid at normal temperature under atmospheric pressure, a polymer (A3) including an aromatic group and at least two photopolymerizable groups, having a molecular weight of 300 to 5000, and being a liquid at normal temperature under atmospheric pressure, a compound (a1) including an aromatic group, having a molecular weight of 100 to 1000, and being a liquid at normal temperature under atmospheric pressure, a compound (a2) including at least two photopolymerizable groups, having a molecular weight of 100 to 1000, and being a liquid at normal temperature under atmospheric pressure, and a compound (a3) including an aromatic group and at least two photopolymerizable groups, having a molecular weight of 100 to 1000, and being a liquid at normal temperature under atmospheric pressure.

Film forming composition for hard disk

There is provided an imprint material forming a film having high abrasion resistance even after a pattern has been transferred thereto, specifically an imprint material forming a film having a small number of pieces of scratch when the film after a pattern has been transferred thereto is subjected to a steel wool abrasion test. An imprint material comprising: a component (A): a compound having at least one ethylene oxide unit and having at least one polymerizable group; a component (B): a polycaprolactone-modified urethane compound having a Clong chain alkyl group and at least one polymerizable group; and a component (C): a photopolymerization initiator.

Highly abrasion-resistant imprint material containing urethane compound

There is provided an imprint material from which a film having a high hardness can be formed. An imprint material comprising a component (A), a component (B) and a component (C), the component (A) being a compound having, in the molecule thereof, five or more polymerizable groups, the component (B) being a compound having, in the molecule thereof, two polymerizable groups, and the component (C) being a photo-radical generator.

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Funabashi, Japan

Keisuke Shuto