Mitsubishi Chemical Corporation

Mitsubishi Chemical Industries Limited

Mitsubishi Kasei Corporation

Keisuke Nakano

Mineo Nishi

Koji Nakano

Takeshi Ikeda

Yoshihiro Takada

Tadashi Kusumoto

Iwao Matsuo

Hideo Handa

A photosensitive resin composition comprising an alkali-soluble resin, a quinonediazide-type photosensitive compound and a solvent, wherein the photosensitive compound comprises 1 a quinonediazide sulfonate of a novolak resin (A) of the following formula (i) having a weight average molecular weight of from 600 to 2,200 or a novolak resin (B) of the following formula (ii) having a weight average molecular weight of from 600 to 2,200, and 2 a quinonediazide sulfonate of a hydroxybenzophenone (C) of the following formula (iii): ##STR1## wherein each of R.sup.1 and R.sup.4 is an alkyl group, R.sup.2 is an alkyl group or an aryl group, R.sup.3 is a hydrogen atom or an alkyl group, each of u and v is an integer of from 0 to 3, provided that when each of R.sup.1 to R.sup.4 is present in a plurality, the plurality of each of R.sup.1 to R.sup.4 may be the same or different, and each of k and l is a number of at least 0, provided that k:l=1:9 to 10:0; ##STR2## wherein R.sup.5 is a hydroxyl group or a alkyl group, each of R.sup.6 and R.sup.9 is a hydrogen atom, an alkyl group or an aryl group, each of R.sup.7 and R.sup.10 is a hydrogen atom or an alkyl group, R.sup.8 is an alkyl group, x is an integer of from 0 to 2, y is an integer of from 0 to 3, provided that when each of R.sup.5 to R.sup.10 is present in a plurality, the plurality of each of R.sup.5 to R.sup.10 may be the same or different, and each of m and n is a number of at least 0, provided that m:n=10:0 to 6:4; ##STR3## wherein each of p and q is an integer of at least 0, provided that 3.ltoreq.p+q.ltoreq.6.

Photosensitive resin composition and method for forming a pattern using

A photoresist composition useful for the preparation of semiconductors and to be irradiated by light with a wavelength of from 330 to 450 nm, which comprises (1) an alkali-soluble resin, (2) a quinone-diazide type photosensitive compound and (3) a solvent, wherein

Photoresist composition comprising a quinone diazide sulfonate of a

A method for fibrillating carbonaceous fibers, which comprises contacting a tow of carbonaceous fibers to rotating surfaces of rollers for fibrillation, wherein at least two rollers are disposed so that the center axes of the rollers intersect the direction of advance of the tow of carbonaceous fibers and the rotating surfaces of the rollers are substantially alternately inclined in opposite directions, thereby to exert a shearing force to the tow in a direction transverse to the direction of advance of the tow.

Method for fibrillating carbonaceous fibers

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Kitakyushu, Japan

Keisuke Nakano