Mitsui Chemicals, Inc.

Yasuhiro Koike

Keisuke Kawashima

Takashi Oda

Koji Inoue

Tadahiro Sunaga

Hirofumi Io

A material for forming an underlayer film according to the present invention is a material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the material including a cyclic olefin polymer which has a repeating structural unit [A] represented by Formula (1) and a repeating structural unit [B] represented by Formula (2), in which a molar ratio [A]/[B] of the structural unit [A] to the structural unit [B] in the cyclic olefin polymer is greater than or equal to 5/95 and less than or equal to 95/5.

Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate

Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G') curve and a loss modulus (G&#x2033;) curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30&#xb0; C. to 300&#xb0; C., a heating rate of 3&#xb0; C./min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40&#xb0; C. and lower than or equal to 200&#xb0;.

Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate

Disclosed is an optical material including a cyclic olefin copolymer containing at least a repeating structural unit [A] represented by the general formula (1) and a repeating structural unit [B] represented by the general formula (2) and having a molar ratio [A]/[B] of from 95/5 to 1/99, wherein the absolute value of the ratio &#x394;OB/&#x394;F is from 0.001 to 0.250 in which &#x394;OB represents the amount of a change in the absolute value of the orientation birefringence calculated from the phase difference (nm) at a wavelength of 633 nm/film thickness (&#x3bc;m) in a stretched film obtained from the optical material, and &#x394;F represents the amount of a change in the absolute value of the orientation coefficient determined from the dichroic ratio of parallel light intensity Ito perpendicular light intensity I, each relative to the orientation direction according to Raman spectroscopy. 

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Ichihara, Japan

Keisuke Kawashima