Mitsubishi Rayon Company, Limited

Keisuke Katou

Shinichi Maeda

Daisuke Matsumoto

Atsushi Yasuda

Tomoya Oshikiri

A copolymer obtained by polymerizing two or more types of monomers, wherein among fractions obtained by dividing an eluate showing peaks relative to the copolymer, in an elution curve obtained by gel permeation chromatography (GPC), into eight fractions in order of fractionation, such that each fraction has the same volume, a difference between a monomer composition ratio of a copolymer contained in a first eluted fraction and a monomer composition ratio of all copolymers is &#x2212;3 mol % to +3 mol % in any of the constitutional units derived from the respective monomers.

Polymer for lithography

A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.

Method for producing polymer, polymer for lithography, resist composition, and method for producing substrate

The present invention provides a method for evaluating lithographic characteristics of a lithographic composition containing a copolymer for lithography without actually preparing the composition. The method comprises the steps of: dissolving the copolymer for lithography in a solvent to prepare a test solution; separating a gel-like substance from the test solution; determining a rate of change of a composition ratio, wherein the rate of change of the composition ratio rate refers to a ratio of a difference obtained by subtracting a composition ratio of constitutional units in the copolymer for lithography from a composition ratio of constitutional units in a gel-like substance to the composition ratio of the constitutional units in the copolymer for lithography.

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Yokohama, Japan

Keisuke Katou