Shimadzu Corporation

Keisuke Iso

Takao Okado

In an ionization device for an ionization chamber () separated from an analysis chamber (-) by a partition wall having an ion introduction port (), an ionization probe () sprays a liquid sample. A heated-gas supply mechanism (), which includes a gas supply source and a heating section () for heating a gas supplied from the gas supply source, expels the gas in a direction intersecting with the direction in which the liquid sample is sprayed from the ionization probe. A controller () controls an operation of the heated-gas supply mechanism so that the gas is continuously expelled from the heated-gas supply mechanism regardless of the presence or absence of an operation by a user while the liquid sample is sprayed from the ionization probe. The continuous expulsion of the gas from the heated-gas supply mechanism prevents this mechanism from being contaminated by the sprayed liquid.

Ionization device and ionization method

A column oven that may enable a heat block to provide the best temperature distribution, and increase temperature evenness of a column is provided. In a column oventhat heats or cools a heat blockcontacting a columnand adjusts temperature of the columnthrough heat transmission from the heat block, a plurality of temperature adjustment bodiesandis separately disposed along the longitudinal direction of the heat block, and heats or cools the heat block, a plurality of temperature sensorsandmeasuring the temperatures of the heat blockadjacent to the temperature adjustment bodiesandis also disposed, and the corresponding temperature adjustment bodiesandare controlled independently according to the temperatures measured by the temperature sensorsand

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Kyoto Pref., Japan

Keisuke Iso