Fujikin Inc.

Keisuke Ideguchi

Kouji Nishino

Kaoru Hirata

Katsuyuki Sugita

Shinya Ogawa

Nobukazu Ikeda

Masaaki Nagase

Naofumi Yasumoto

Hiroyuki Ito

Atsushi Hidaka

Masafumi Kitano

Kazuyuki Morisaki

Kosuke Sugimoto

A pressure control device includes a pressure control valve, a flow resistance provided downstream of the pressure control valve, a first pressure sensor for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor for measuring a gas pressure downstream of the flow resistance, and a calculation control circuit connected to the first pressure sensor and the second pressure sensor, wherein the pressure control device controls the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculates the flow rate of the gas downstream of the flow resistance, based on the outputs of the first and the second pressure sensors.

Pressure control device

A flow rate control device () includes a control valve () having a valve element and a piezoelectric element for moving the valve element, and an arithmetic processing circuit () for controlling an operation of the control valve, wherein the arithmetic processing circuit is configured to receive an external command signal SE corresponding to a target flow rate when opening the control valve from a closed state so that a gas flows at the target flow rate, and to generate an internal command signal Eoutput to a driving circuit for determining a voltage applied to the piezoelectric element based on the external command signal, the internal command signal is a signal that rises with time from zero and converges to a value of the external command signal, and is generated such that a slope at the time of initial rise and a slope immediately before convergence are smaller than a slope therebetween.

Flow rate control device and flow rate control method wherein an internal command signal is generated by a combination of first order lag process and ramp process

The flow rate control deviceincludes a control valve, a restriction partprovided downstream of the control valve, an upstream pressure sensorfor measuring a pressure Pbetween the control valveand the restriction part, a differential pressure sensorfor measuring a differential pressure ΔP between the upstream and the downstream of the restriction part, and an arithmetic control circuitconnected to the control valve, the upstream pressure sensor, and the differential pressure sensor

Flow rate control device

A flow rate control deviceincludes a control valveprovided in a flow path, a flow rate measurement unitfor measuring fluid flow rate controlled by the control valve, and a controller. The controlleris configured so as to control the opening/closing operation of the control valveto match the measurement integral flow rate based on the signal outputted from the flow rate measurement unit (Vn+Vd) to the target integral flow rate Vs.

Flow rate control device and flow rate control method

A diaphragm valve includes a body () having a flow path (), a seat () formed in the flow path (), a metal diaphragm () for opening and closing the flow path (), a pair of clamping parts () and () for claiming peripheral edge portions of the metal diaphragm () to fix the metal diaphragm () to the body (), and an actuator () for abutting the metal diaphragm () to the seat () or separating the metal diaphragm from the seat (), wherein a fluorine resin coating is formed on a seat side surface () of the metal diaphragm () at least in a contact region (B-A) with the seat () in a region (C) surrounded by a clamping region (D-C) between the seat side surface () and one of the pair of clamping portions (), excluding the clamping region (D-C).

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Osaka, Japan

Keisuke Ideguchi