Fujifilm Corporation

Keisuke Arimura

Takashi Sato

Hisashi Mikoshiba

Daisuke Sasaki

Takahiro Okawara

Yoshihiro Jimbo

Kazuya Oota

Kazuto Shimada

Tokihiko Matsumura

Takashi Kawashima

Kyohei Arayama

Takahiro Goto

Yoshinori Taguchi

Hidekazu Oohashi

Toyohisa Oya

Toshifumi Inno

Takashi Katoh

Yuki Hirai

Seiichi Hitomi

Kenji Hayashi

Takuya Tsuruta

Satoru Murayama

Shigefumi Kanchiku

Manabu Hashigaya

Yuriko Ishiguro

Yutaro Norizuki

Go Nishino

Provided is a laminate having a good whiteness and a high infrared-shielding property. Provided are also a kit forming the above-mentioned laminate, a method for producing a laminate, and an optical sensor. The laminate includes an infrared-shielding layer and a white layer, in which the infrared-shielding layer is a layer that shields at least a part of a wavelength range at 800 to 1,500 nm, and the white layer has a value of L* of 35 to 100, a value of a* of &#x2212;20 to 20, and a value of b* of &#x2212;40 to 30 in a L*a*b* color coordinate system of CIE 1976.

Laminate, kit, method for producing laminate, and optical sensor

A composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23&#xb0; C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.

Composition, film, near infrared cut filter, laminate, pattern forming method, solid image pickup element, image display device, infrared sensor, and color filter

Provided are a near infrared absorbing composition with which a cured film having excellent solvent resistance and thermal shock resistance can be manufactured, a near infrared cut filter, a method of manufacturing a near infrared cut filter, a solid image pickup element, a camera module, and an image display device. The near infrared absorbing composition includes: a resin A that satisfies the following condition a1; an infrared absorber B; and a solvent D. At least the resin A has a crosslinking group, or the near infrared absorbing composition further includes a compound C having a crosslinking group that is different from the resin A.

Near infrared absorbing composition, near infrared cut filter, method of manufacturing near infrared cut filter, solid image pickup element, camera module, and image display device

The composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23&#xb0; C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.

The present invention relates to an infrared sensor, a near-infrared ray absorption composition, a photosensitive resin composition, a compound, a near-infrared ray absorption filter, and an image pick-up device. Provided is an infrared sensorthat detects an object by detecting light in wavelengths of 900 nm to 1,000 nm, including infrared ray transmission filtersand near-infrared ray absorption filters, in which the near-infrared ray absorption filterscontains a near-infrared ray absorption substance having a maximum absorption wavelength in wavelengths of 900 nm to 1,000 nm.

Infrared sensor, near-infrared ray absorption composition, photosensitive resin composition, compound, near-infrared ray absorption filter, and image pick-up device

An infrared absorbing composition which is used for forming an infrared cut filter in a solid image pickup element having the infrared cut filter includes at least one infrared absorber having an absorption maximum at a wavelength of 650 nm or longer which is selected from polymethine colorants.

Infrared absorbing composition, infrared cut filter, laminate, pattern forming method, solid image pickup element

Provided are a near infrared ray absorbent composition which can form a cured film having excellent heat resistance while maintaining high near infrared ray shielding properties, and a near infrared ray cut filter, a manufacturing method of a near infrared ray cut filter, a solid image pickup element, and a camera module using the near infrared ray absorbent composition. The near infrared ray absorbent composition contains a compound having a partial structure represented by M-X, and a near infrared ray absorbent compound, and a content of the compound having a partial structure represented by M-X is greater than or equal to 15 mass % with respect to a total solid content of the near infrared ray absorbent composition. Here, M is an atom selected from Si, Ti, Zr, and Al, X is one type selected from a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group, and O&#x2550;C(R)(R), Rand Reach independently represent a monovalent organic group, and in a case in which X is O&#x2550;C(R)(R), X is bonded to M by an unshared electron pair of an oxygen atom of a carbonyl group.

Near infrared ray absorbent composition, near infrared ray cut filter, manufacturing method of near infrared ray cut filter, solid image pickup element, camera module

A process for making a lithographic printing plate, comprising: an exposure step of imagewise exposing a lithographic printing plate precursor that comprises, above a hydrophilic support, a photosensitive layer comprising (A) a compound that generates a radical upon the application of light or heat, (B) a polymer having an aromatic carboxy group in a side chain, (C) a polymerizable compound, and (D) an infrared absorber; and a development processing step using one type of processing liquid, wherein the processing liquid has a pH of 8.5 to 10.8.

Process for making lithographic printing plate

A coating method of forming a plurality of layers on a belt-like support continuously traveling, comprising:

Coating method, coater, and method for manufacturing planographic printing plate

A planographic printing plate precursor having an intermediate layer containing a copolymer containing structural units represented by Formulae (1), (2) and (3) below, and a image forming layer, in this order on a support, wherein R, Rand Reach represent a hydrogen atom, a substituent having from 1 to 30 carbon atoms, or a halogen atom, Lrepresents a single bond or a (n+1)-valent connecting group, n represents an integer of from 0 to 10, Lrepresents a single bond or a (m+1)-valent connecting group, X represents a carboxylate ion, M represents a counter cation necessary for neutralization of charge, m represents an integer of from 1 to 10, and Y represents a substituent having from 0 to 30 carbon atoms, provided that Y does not represent a carboxy group and does not represent the same constituent as (XM).

Planographic printing plate precursor and method of producing a copolymer used therein

There is provided a polymerizable composition comprising (A) a binder polymer, (B) a polymerizable compound having an unsaturated group, and (C) a diaryl iodonium salt having at least two electron-donating groups. The iodonium salt (C) preferably has three or more electron-donating groups. This polymerizable composition is useful as a recording layer of a negative type planographic printing plate precursor.

Polymerizable composition and planographic printing plate precursor using the same

A photosensitive lithographic printing plate comprising: a hydrophilic support; and a photosensitive layer containing a polymerization initiator, a chain transfer agent, a compound having an ethylenically unsaturated double bond and a polymer binder having a crosslinkable group in a side chain, wherein the chain transfer agent is a thiol compound represented by the following formula (I): in which R represents an alkyl group which may have a substituent or an aryl group which may have a substituent; and A represents an atomic group necessary for forming a 5-membered or 6-membered hetero ring containing a carbon atom together with the N&#x2550;C&#x2014;N linkage, and A may have a substituent.

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Haibara-gun, Japan

Keisuke Arimura