Nippon Sheet Glass Company, Limited

Pilkington Group Limited

Keiko Tsuri

Satoshi Tanaka

Yasuhiro Saito

Kazuishi Mitani

Hirotaka Koyo

David Alan Strickler

Douglas Martin Nelson

Kevin David Sanderson

Michel J Soubeyrand

Yasunori Seto

Ian Ross Williams

Kevin D Sanderson

The glass sheet production method of the present invention is a method for producing a surface-modified glass sheet, including a gas contact step of bringing hydrogen fluoride (HF) gas, hydrogen chloride (HCl) gas, and water vapor into contact with at least one principal surface of a glass sheet. A gas containing the hydrogen fluoride (HF) gas is used in the gas contact step, and in the gas containing the hydrogen fluoride (HF) gas, a volume ratio of the water vapor to the hydrogen fluoride (HF) gas (volume of water vapor/volume of HF gas) is 8 or more.

Method for producing glass sheet, and glass sheet

The glass sheet production method of the present invention includes the steps of: (I) bringing a first acid gas into contact with at least one principal surface of a sheet-shaped glass material, the first acid gas containing hydrogen fluoride (HF) gas but not containing hydrogen chloride (HCl) gas and having a volume ratio of water vapor to HF gas of less than 8, the glass material containing at least sodium as a component and having a temperature in a range from a glass transition temperature to a temperature 250&#xb0; C. higher than the glass transition temperature; (II) before or after the step (I), bringing a second acid gas into contact with the principal surface of the sheet-shaped glass material, the second acid gas containing HCl gas and optionally containing HF gas, wherein when the second acid gas contains both HCl gas and HF gas, the second acid gas further contains water vapor with a volume ratio of water vapor to HF gas of 8 or more; and (III) cooling the sheet-shaped glass material having undergone both the step (I) and the step (II) so as to obtain a glass sheet.

Method for producing glass sheet

The invention relates to an apparatus for depositing thin film coatings on a substrate. The deposition apparatus is designed to keep gaseous reactant materials to be deposited apart from one another in the deposition apparatus, by one or more separation devices and/or methods, but nevertheless, to allow the chemical reactants to mix and react at or near the substrate surface, rapidly enough to create a uniform film at commercially viable deposition rates.

Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus

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Osaka, Japan

Keiko Tsuri