Kao Corporation

Japan Science and Technology Agency

Sumco Corporation

Keiko Matsuo

Takashi Kawai

Toshio Yamazaki

Eiichi Nakamura

Naoyuki Wada

Manabu Kaneda

Masaharu Nakamura

Kenji Kaneda

Masahiko Egashira

Noriyuki Tanaka

Shingo Ito

Yoshimune Nonomura

Provided is a method of inspecting the back surface of an epitaxial wafer, capable of detecting pin mark defects in the back surface of the epitaxial wafer and quantitatively evaluating the defect size of individual point defects of the pin mark defects. The method of inspecting the back surface of an epitaxial wafer includes an imaging step of consecutively taking partial images of the back surface while moving the optical system using the scanning unit; an acquisition step of acquiring a full image of the back surface from the partial images; a detection step of detecting, in the full image, pin mark defects constituted by a set of a plurality of point defects present in the back surface of the silicon wafer; and a digitalization step of digitalizing the individual point defects to calculate the defect area of the individual point defects of the detected pin mark defects.

Method of inspecting back surface of epitaxial wafer, epitaxial wafer back surface inspection apparatus, method of managing lift pin of epitaxial growth apparatus, and method of producing epitaxial wafer

There is provided a cosmetic composition, which stably includes disintegrable particles and is excellent in feeling upon use. A gel cosmetic composition, which has a pH of 4 to 9 and includes the following components (A), (B), (C), (D), and (E): (A) disintegrable particles obtainable binding water-insoluble primary particles by use of a water-soluble binder; (B) 15% to 70% by weight of polyol; (C) a thickening polymer compound having a carboxy group; (D) less than 1% by weight of water-soluble salts; and (E) water.

Gel cosmetic composition comprising disintegrable particles, a polyol, a thickening polymer and water

A problem of the present invention is to provide an economical process with minimized toxicity for producing an aromatic compound having a variety of substituents such as various alkyl groups, and the problem is solved by a process for production of an aromatic compound represented by formula (1) below, which comprises reacting a compound represented by formula (2) below with an aromatic magnesium reagent represented by formula (3a) below in the presence of an iron catalyst and a diamine compound: wherein R is an optionally substituted hydrocarbon group or a C-Csaturated or unsaturated ring group; A is an optionally substituted C-Caromatic group or an optionally substituted heteroaromatic group; X is a halogen atom or a sulfonic acid ester; and Yis bromine, iodine, chlorine or a carbanion ligand.

Process for production of aromatic compounds

A sheet-like body cleaning material comprising a woven fabric or nonwoven fabric sheet impregnated with an aqueous cleaning liquid containing 10 to 30% by weight of a surfactant an 10 to 25% by weight of ethanol, wherein the aqueous cleaning liquid is contained in an amount of 0.5 to 4 g based on 1 g of the sheet.

Sheet-like body cleaning material

A cleansing material comprising a sheet material impregnated with an emulsion having a viscosity of 200 to 4000 mPa&middot;s at 25&deg; C. and a viscosity of 100 to 2000 mPa&middot;s at 50&deg; C.

Cleansing material

A personal cleansing sheet with which the skin and hair can be easily cleansed of oily soils such as sebum and aqueous soils such as sweat or salts, has a structure in which an oily substance absorption layer that serves as a region that absorbs oil substances is laminated with an aqueous cleansing liquid retention layer that serves as a region that retains an aqueous cleansing liquid.

Growing community of inventors

Tokyo, Japan

Keiko Matsuo