Mitsubishi Denki Kabushiki Kaisha

Keiko Ito

Hajime Nakatani

Atsushi Sugitatsu

Masaharu Moriyasu

Tadao Minagawa

Toshinori Yagi

Yasumasa Nishimura

Yoichi Masubuchi

Masanao Maruta

Kazuyuki Murakami

Shinichi Seki

Yoshimasa Akashi

Satoko Hisatome

Masaaki Oji

Hiroyuki Takeoka

Burst pressure P of an insulating layer positioned immediately on a fuse layer is defined by using planar width W of fuse layer and thickness t of insulating layer. The value of the planar width W of fuse layer and the value of the thickness t of insulating layer are set such that the value of burst pressure P is at most about 1000 kg/cm.sup.2. The value of the thickness t and the value of the planar width W are set such that the value t/W is at least 0.45 and at most 0.91. Consequently, stable fuse blowing becomes possible while reducing manufacturing cost.

Semiconductor device having a fuse layer

A method for manufacturing a magnetic head includes the process by which a curved sliding surface of a head chip for making contact with a recording medium and a penetrating window of a side surface of the head chip for determining a gap depth are formed by machining the head chip using a laser beam. The method includes placing the head chip on a working stage; placing a first mask in a light path of a laser beam from a laser source toward the side surface, the first mask being provided with a first slit for the purpose of forming the curved sliding surface of the head chip and a second slit for the purpose of forming the penetrating window of the side surface of the head chip; and irradiating the side surface through the first and second slits with the laser beam, thereby forming the curved sliding surface and the penetrating window in the head chip. The method also may include forming track grooves by irradiating the sliding surface of the head chip with the laser beam.

Method for manufacturing a magnetic head

An excimer laser beam irradiation apparatus capable of processing a workpiece optimally with an excimer irradiation beam even when intensity distribution of the excimer laser beam undergone multiple reflections is non-uniform. A patterning mask has light-transmissive portions for allowing the excimer laser beam to pass through and a reflecting layer for reflecting it. A high reflectivity mirror disposed in opposition to the reflecting layer reflects the excimer laser beam reflected from the reflecting layer toward the patterning mask. An imaging lens images a pattern of the excimer laser beam transmitted through the patterning mask onto a workpiece for irradiation thereof. A workpiece moving mechanism and a mask moving mechanism move the workpiece and the mask moving mechanism, respectively. A control unit controls the workpiece moving mechanism and the mask moving mechanism such that the patterning mask and the workpiece are displaced along a same axis synchronously with each other in a scan moving direction which coincides with a direction in which the excimer laser beam shifts positionally while being reflected between the patterning mask and the reflecting means, for thereby allowing the workpiece to be scanned with the excimer laser beam. The workpiece can be processed uniformly and stably in accordance with a pattern of the patterning mask with high accuracy and reliability.

Excimer laser beam irradiation apparatus for optically processing

Growing community of inventors

Amagasaki, Japan

Keiko Ito