Hokkaido University

Daicel Corporation

University Public Corporation Osaka

Keiji Sasaki

Hiroaki Misawa

Kosei Ueno

Yasuyuki Tsuboi

Yuto Makino

Xu Shi

Hajime Ishihara

Tomoya Oshikiri

Quan Sun

Takudo Wada

A particle discrimination mechanism includes: a channel in which a plurality of first nanoparticles each including an absorber having a predetermined absorption level and a plurality of second nanoparticles each of which does not include the absorber having the predetermined absorption level exist, the channel including a first input section and a second input section; a laser that outputs first light, which is absorbed by the absorber having the predetermined absorption level, in a direction from the first input section toward the second input section; a laser that outputs second light, which is not absorbed by the absorber having the predetermined absorption level but is scattered or absorbed by the second nanoparticles, in a direction from the second input section toward the first input section.

Particle discrimination mechanism

This light absorbing device includes: a light reflecting layer; a dielectric layer disposed on the light reflecting layer; and a plurality of metal nanostructures disposed on the dielectric layer. A portion of each of the plurality of metal nanostructures is buried in the dielectric layer and another portion thereof is exposed to the outside.

Light absorbing device, manufacturing method thereof, and photoelectrode

A metal structure capable of significantly increasing wavelength selectivity and polarization electivity for an incident light, and a production method thereof. First, a solid transparent substrate (glass substrate) () is cleaned and dried (S). The surface of the substrate () is spin-coated with a positive electron lithography-use resist solution and then baked, and the resist solution is removed to form a resist thin film () on the substrate () (S). A specified pattern is drawn on the resist thin film () with an electron beam, and the film is developed, rinsed and dried (S). Then, metals such as chromium and then gold are formed sequentially on the substrate () by sputtering (S). And, excessive resist materials are removed from the surface of the substrate () (S), whereby metal nano-rod array () is completed. The metal nano-rod array () has a structure in which many metal nano-rods having their sizes precisely controlled are integrated on the substrate () at constant fine intervals and with their directions aligned in one axial direction.

Metal structure and production method therefor

There are provided a sensing device, a sensing apparatus, and a sensing method capable of realizing effective multi-photon absorption and local plasmon enhancement function. The sensing device can realize a high multi-photon excitation efficiency and selectivity by accurately controlling the material, shape, size, interval, and direction of metal particles arranged on a substrate. By employing the sensing device in various sensing apparatuses such as a fluorescent sensing apparatus, it is possible to realize sensing of detection object material with a high sensibility.

Sensing device, sensing apparatus, and sensing method

Growing community of inventors

Sapporo, Japan

Keiji Sasaki