Wako Pure Chemical Industries, Inc.

Matsushita Electric Industrial Co., Ltd.

Japan Science and Technology Corporation

Keiji Oono

Fumiyoshi Urano

Hirotoshi Fujie

Masaaki Nakahata

Hiroshi Matsuda

Masayuki Endo

Takaaki Negishi

Satoshi Kobayashi

Shu Kobayashi

Motoshige Sumino

Atsunori Sano

Shigeaki Imazeki

Kazunori Sakamoto

Kazuhito Fukasawa

Mutsumi Sato

The present invention discloses 1) a catalyst composition consisting of a crosslinked organic polymer compound and a palladium catalyst, wherein said catalyst is physically carried on said crosslinked organic polymer compound, 2) a manufacturing method of the above catalyst composition 1), characterized by homogenizing a straight chain organic polymer compound, having a crosslinkable functional group, and a palladium catalyst in a solvent dissolving said straight chain organic polymer compound, then depositing a composition thus formed and subjecting the crosslinkable functional group in said deposit to a crosslinking reaction, 3) a method for substitution reaction at an allyl position, characterized by reacting an allyl carbonate and a neucleophilic agent in the presence of the above catalyst composition 1), and 4) a method for oxidizing an alcohol, characterized by subjecting the above catalyst composition 1) to reaction with an alcohol.

Palladium catalyst composition

The present invention discloses a method for producing a hydroxylamine compound wherein a nitro compound is contacted with a hydrogen source or further with a poisoning agent in the presence of a platinum catalyst fixed on an ion-exchange resin. According to the method of the present invention where a platinum catalyst fixed on a matrix of an ion-exchange resin is used, the objective hydroxylamine compound can be produced (manufactured) efficiently, more industrially and safely with little formation of a byproduct. Further, the platinum catalyst fixed on an ion-exchange resin of the present invention is hardly deactivated even if repeatedly used many times because platinum metal is fixed on a matrix of the ion-exchange resin, and handling in recovery, reuse and the like of said catalyst is extremely easy because particle size of said catalyst is very large.

Method for producing hydroxylamine compound using platinum catalyst fixed on ion-exchange resin

wherein Ris a Cbranched or cyclic alkyl group, and Ris a Cstraight-chain, branched or cyclic alkyl group, is effective as a photoacid generator when used in a photoresist material for light of 300 nm or less.

Diazodisulfones

Sulfonium salt compounds

A polymer of polyhydroxystyrene derivative containing an acetal or ketal group which can easily be eliminated in the presence of an acid in the molecule and having a very narrow molecular weight distribution gives a resist material suitable for forming ultrafine patterns excellent in resolution, heat resistance, mask linearity, and other properties without causing problems of delay time and the like.

Polymer and resist material

A polymer composition comprising (i) a polymer (a) having a monomer unit containing a functional group A which becomes alkali-soluble by heating in the presence of an acid, (ii) a polymer (b) having a monomer unit containing a functional group B which also becomes alkali-soluble, but less easily than the functional group A, by heating in the presence of an acid, and if necessary in addition to (i) and (ii) or in place of (ii), (iii) a phenolic compound having a weight-average molecular weight of 300 to 15,000 gives together with an photoacid generator a resist material suitable for forming a pattern excellent in sensitivity, resolution, mask linearity and other properties.

Polymer composition and resist material

A deep ultraviolet absorbent comprising at least one compound having one or more glycidyl groups in the molecule and at least one anthracene derivative, and a solvent capable of dissolving these compounds is effective for preventing reflection of deep ultraviolet light from a substrate during formation of resist pattern, resulting in forming ultra-fine patterns without causing notching and halation.

Process for forming a pattern on a semiconductor substrate using a deep

A resist composition comprising (a) a polymer having at least repeating units of the formulae: ##STR1## (b) a photoacid generator and (c) a solvent, has high sensitivity to light, excellent heat resistance, adhesiveness to a substrate and suitable for pattern formation with high resolution.

Pattern formation process

A photoresist composition comprising (a) a difficultly alkali-soluble special resin, (b) a photo-sensitive compound capable of generating a carboxylic acid, and (c) a solvent, is effective for pattern formation using deep ultraviolet light, KrF excimer laser beams, etc.

Resist material

Deep ultraviolet absorbent composition

An anthracene derivative having at least two groups of the formula: ##STR1## wherein R.sup.1 and R.sup.2 are independently hydrogen, alkyl, alkoxy, etc., is particular effective for forming an antireflection coating for preventing multiple reflection of exposing light from a highly reflective substrate, etc.

Anthracene derivatives

Resist material and pattern formation process

A resist material comprising (a) a polymer having a monomer unit having a special functional group, a monomer unit having a phenolic hydroxyl group, and if necessary a third monomer unit, (b) a photoacid generator, and (c) a solvent can provide a resist film excellent in heat resistance and adhesiveness to a substrate when exposed to light with 300 nm or less such as deep UV light, KrF excimer laser light, etc., and is suitable for forming ultrafine patterns.

Chemical amplified resist material containing photosensitive compound

A diazodisulfone of the formula: ##STR1## wherein R.sup.1 is a C.sub.3-8 branched or cyclic alkyl group, and R.sup.2 is a C.sub.1-8 straight-chain, branched or cyclic alkyl group, is effective as a photoacid generator when used in a photoresist material for light of 300 nm or less.

Growing community of inventors

Kawagoe, Japan

Keiji Oono