Tokyo Electron Limited

Keiichi Yahata

Hiroaki Inadomi

Satoshi Biwa

Satoshi Okamura

Yasuo Kiyohara

Kouji Kimoto

Tooru Nakamura

Katsuhiro Ookawa

Tetsuro Nakahara

Nobuya Yamamoto

Provided is a substrate processing apparatus including a liquid processing unit that performs a liquid processing on a substrate; a drying processing unit that performs a drying processing on the substrate in a wet state; a first conveyance unit that conveys the substrate to the liquid processing unit; a second conveyance unit that conveys the substrate in the wet state from the liquid processing unit to the drying processing unit; and a third conveyance unit that conveys the substrate before the liquid processing in the liquid processing unit and to convey the substrate after the drying processing from the drying processing unit. The first and second conveyance units and the drying processing unit are disposed on a side that faces the third conveyance unit, and the liquid processing unit is disposed on a side that faces the first and second conveyance units and is opposite to the third conveyance unit.

Substrate processing apparatus

Growing community of inventors

Kumamoto, Japan

Keiichi Yahata