Seiko Epson Corporation

Keiichi Suehiro

Tetsuo Shimizu

Takeshi Hagiwara

For providing a liquid crystal device comprising a structure capable of uniformly supporting a terrace area in the liquid crystal device, a pair of insulation filmsare formed on the terrace areaso as to cover a part of wiring linesandsimultaneously with forming the insulation filmson electrodesusing the same material as the insulation film on the electrodes, and an orientation filmis additionally formed on the insulation films. The orientation filmis also formed on the insulation filmsformed on the terrace area, and the orientation filmis formed so as to expand out of the outer edge of the insulation films

Liquid crystal device and manufacturing method thereof

A cleaning apparatus includes cleaning vessels and for storing cleaning water &ldquo;W &rdquo; used for cleaning an article to be cleaned concentrating vessels and for storing sewage &ldquo;W &rdquo; discharged from the cleaning vessels; an ultrafiltration membrane for receiving the sewage &ldquo;W &rdquo; discharged from the concentrating vessels to separate the received sewage into filtered water &ldquo;W &rdquo; and concentrated sewage &ldquo;W &rdquo;; and waterway lines &ldquo;L &rdquo; and &ldquo;L &rdquo; for returning the concentrated sewage &ldquo;W &rdquo; discharged from the ultrafiltration membrane to the concentrating vessels and The filth is removed from the article to be cleaned by dipping the article to be cleaned into the cleaning water &ldquo;W &rdquo;. The ultrafiltration membrane is provided with a backwash filtration system &ldquo;L &rdquo;, &ldquo;B &rdquo;, and &ldquo;P &rdquo; for removing filthy refuse.

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Matsumoto, Japan

Keiichi Suehiro