Rigaku Corporation

Keiichi Morikawa

Hiroki Yoshida

Akito Sasaki

Kazuhiko Omote

Katsuhiko Inaba

Akihiro Himeda

Toru Mitsunaga

Yuji Tsuji

Toshiyuki Kato

Yoshinori Ueji

Kunio Nishi

Atsunori Kiku

Takao Ohara

Aya Kuribayashi

Yayoi Taniguchi

Masahiro Tsuchiya

Takeshi Fujimura

An X-ray analysis assistance device with an input and operation devicefor arbitrarily inputting and setting the value of one from among the distance L between a sample S and a two-dimensional detectorand the maximum detection range Xmax for X-rays scattered or diffracted by the sample S, and a central processing unitfor automatically setting the other setting item on the basis of the value of the one setting item set by the input and operation device. Further, the maximum measurement frame Hmax for the X-rays is displayed on a display screenof a display deviceon the basis of the distance L and maximum detection range Xmax. Additionally, an X-ray detection area A indicating the range within which it is possible for the detection surface of the two-dimensional detectorto detect X-rays is displayed on the display screenof the display device

X-ray analysis assistance device and x-ray analysis device

Disclosed is an X-ray topography apparatus including an X-ray source, a multilayer film mirror, a slit, a two-dimensional X-ray detector, and a sample moving device that sequentially moves the sample to a plurality of step positions. The X-ray source is a minute focal spot. The multilayer film mirror forms monochromatic, collimated, high-intensity X-rays. The direction in which the multilayer film mirror collimates the X-rays coincides with the width direction of the slit. The step size by which the sample is moved is smaller than the width of the slit. The combination of the size of the minute focal spot, the width of the slit, and the intensity of the X-rays that exit out of the multilayer film mirror allows the contrast of an X-ray image produced when the detector receives X-rays for a predetermined period of 1 minute or shorter to be high enough for observation of the X-ray image.

X-ray topography apparatus

An X-ray analysis apparatus having a function for enabling a plurality of measurement methods to be implemented, the X-ray analysis apparatus having: a measurement system capable of implementing a plurality of measurement methods; measurement software for implementing, in a selective manner, each of the measurement methods; a material evaluation table for storing information relating to a material that may be measured, and a name of an evaluation performed on the material; an input device for inputting the information relating to the material; a wizard program for performing computation for selecting the name of an evaluation on the basis of the information relating to the material inputted using the input device; and a wizard program for selecting a corresponding measurement method on the basis of the selected name of the evaluation.

X-ray analysis apparatus

An X-ray analysis apparatus having a function for enabling a plurality of measurement methods to be implemented, the apparatus having: measurement software for implementing each of the individual measurement methods and acquiring measurement data; analysis software for performing a predetermined analysis on the measurement data and acquiring analysis data; reduced-size-image-creating means for creating a reduced-size image on the basis of each item of the measurement data and the analysis data; analysis-icon-creating means for creating an icon for denoting the analysis software; and image display means for displaying the reduced-size image and the icon on the same screen while indicating that the reduced-size image and the icon are correlated.

Peak positions and integrated intensities of diffraction X-ray are determined on the basis of X-ray diffraction measurement data output from an X-ray diffractometer, the number of determined peaks of the diffraction X-ray is counted, and analysis processing is started when the counted number of peaks reaches a preset peak number. The analysis processing is repetitively executed on the basis of X-ray diffraction measurement data. The peak positions and the integrated intensities of the diffraction X-ray are determined from the X-ray diffraction measurement data obtained from the start of the measurement till the analysis processing concerned, and qualitative analysis of collating the determined peak positions and integrated intensities with standard peak card data whose data base is made in advance and searching materials contained in a measurement sample, and quantitative analysis of determining the quantities of the materials contained in the measurement sample are executed.

Analysis method for X-ray diffraction measurement data

An X-ray analysis apparatus has information about a relationship between selection of a measurement type and a replacement work of optical parts and shows, on a screen of a display, graphical information about optical parts which should be changed, to make it easy for an operator to perform a preliminary work before measurement. When the operator selects one desired measurement type among a plurality of measurement types in a selection window, there is displayed on the display, depending on the selected measurement type, graphical information about necessary optical parts which should be newly installed and/or installed optical parts which should be removed. The operator looks at the operating instructions and then performs the replacement work. The graphical information may be: graphical indication of the installation locations of the optical parts; different pictorial expressions about the installation and the removal works; and graphical indication of the identification marks of the optical parts.

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Fuchu, Japan

Keiichi Morikawa