Tokyo Ohka Kogyo Co., Ltd.

Keiichi Ibata

Junichi Tsuchiya

Ryoji Watanabe

A hard-mask forming composition that forms a hard mask that is used in lithography, the hard-mask forming composition including at least one of a compound represented by General Formula (sc-1) and a resin having a partial structure represented by General Formula (sc-p1). In the general formula, Rand Rare organic groups having 1 to 40 carbon atoms or hydrogen atoms; Rand Rare aromatic hydrocarbon groups having 6 to 30 carbon atoms which may have a substituent; Rand Rmay be bonded to each other to form a structure having an aromatic heterocyclic ring, and the hydrogen atom of the phenylene group in the formula may be substituted with a substituent

Hard-mask forming composition, method for manufacturing electronic component, and compound and resin

A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.

Hard mask-forming composition and method for manufacturing electronic component

A hard-mask forming composition including a resin (P1) having a repeating structure (u1) represented by General Formula (u1-0), wherein Arand Arare aromatic hydrocarbon groups which may have a substituent, Arhas at least one nitrogen atom or oxygen atom, Land Lare each independently a single-bonded or divalent linking group, and X is NHand the like

Hard-mask forming composition, method for manufacturing electronic component, and resin

A hard-mask forming composition, which is used for forming a hard mask used in lithography, including a first resin and a second resin, in which an amount of carbon contained in the first resin is 85% by mass or more with respect to the total mass of all elements constituting the first resin, and the amount of carbon contained in the second resin is 70% by mass or more with respect to the total mass of all elements constituting the second resin and less than the amount of carbon contained in the first resin.

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Kawasaki, Japan

Keiichi Ibata