Screen Holdings Co., Ltd.

Kei Takechi

Tomohiro Takahashi

Kenji Edamitsu

Masaharu Sato

Takeshi Matsumura

Masayuki Orisaka

Takashi Akiyama

Mitsutoshi Sasaki

Takuya Kishida

Koji Kurasaki

At least part of a processing liquid upward flowing in a storage space is split into a plurality of upflows and guided to a substrate held by a substrate holder. Many upflows are widely dispersed and formed in the processing liquid stored in the storage space, and the generation of downflows in the storage space is suppressed. As a result, bubbles are uniformly supplied to the substrate and substrate processing can be performed in high quality.

Substrate processing apparatus and substrate processing method

A substrate processing device includes a processing tank, a substrate holding unit, a fluid supply unit, and a control unit. The processing tank stores a processing liquid for processing a substrate. The substrate holding unit holds the substrate in the processing liquid in the processing tank. The fluid supply unit supplies a fluid to the processing tank. The control unit controls the fluid supply unit. The control unit controls the fluid supply unit such that the fluid supply unit changes supply of the fluid during a period from a start of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed to an end of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed.

Substrate processing method

A substrate processing method includes a first processing step of processing a substrate using phosphoric acid set to a first temperature in a processing tank, and a second processing step of processing the substrate using phosphoric acid set to a second temperature in the processing tank.

Substrate processing device and substrate processing method

A substrate treatment apparatus according to the present invention is provided with a first tank that stores treatment liquid for treating a substrate and a first path that returns the treatment liquid, which has spilled over from an upper part of the first tank, to a lower part of the first tank. A second path that branches from the first path, a measurement tank that stores the treatment liquid, which has flowed in from the second path, and a pressure measurement part that measures the pressure of the treatment liquid at a predetermined depth in the measurement tank in a state in which the treatment liquid spills over from an upper part of the measurement tank are provided. Therefore, techniques for highly precisely measuring the pressure of the treatment liquid used in treatment of substrates can be provided.

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Kyoto, Japan

Kei Takechi