Hitachi High-tech Corporation

Hitachi-high-technologies Corporation

Kei Shioya

Masahiko Iijima

Eiichiro Takada

Yuya Matsuoka

Rei Konishi

Yasuhiro Keta

Hiroki Akase

Masaaki Sakaguchi

Norihiro Hayashida

Cuvette

When washing the inside of a reactor vessel which is used repeatedly, a rough suction is performed before suctioning with a washing tip; however, unwanted washing liquid may remain that may affect analysis results. The present invention provides an automatic analysis device for analyzing a sample using light, in which the automatic analysis device is characterized in that: a washing mechanism comprises a washing liquid supply nozzle that supplies washing liquid to a reactor vessel after analysis, a washing liquid suction nozzle that suctions the supplied washing liquid, a washing tip provided to the bottom end of the washing liquid suction nozzle, and a rough suction nozzle that suctions, in advance, a liquid within the reactor vessel before suctioning with the washing tip; and after the rough suction, liquid is caused to remain so that the bottom surface of the reactor vessel is not exposed.

Automatic analysis device

Provided are a device and a cleaning mechanism for a reaction container in the device that are characterized by being provided with: a reaction disk for holding a reaction container; a sample dispensing mechanism for dispensing a sample to the reaction container; a reagent dispensing mechanism for dispensing a reagent to the reaction container; an optical system comprising a light source for applying light to a mixture of the sample and the reagent dispensed to the reaction container, and a detector for detecting the light applied from the light source; and a cleaning mechanism for cleaning the reaction container, wherein the cleaning mechanism is provided with a cleaning liquid supply nozzle for supplying a cleaning liquid to the reaction container after an analysis, a cleaning liquid suction nozzle for suctioning the supplied cleaning liquid, and a cleaning tip provided on the lower end of the cleaning liquid suction nozzle, and the side surface of the cleaning tip is formed such that the width of the cleaning tip becomes smaller downward, in the state where the cleaning tip is inserted into the reaction container, in at least a surface opposing the light source and a surface opposing the detector, and in a range that overlaps with a photometric range in which light applied to the reaction container from the light source passes through the reaction container toward the detector or in a range that is larger than the photometric range.

Automatic analysis device and cleaning mechanism in automatic analysis device

Growing community of inventors

Tokyo, Japan

Kei Shioya