Dai-ichi Kogyo Seiyaku Co., Ltd.

Kei Shiohara

Asako Ogasawara

Masatake Joyabu

Chi Tao

Takuro Kimura

The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, Rrepresents one or two groups selected from groups below, Drepresents a polymerizable unsaturated group represented by chemical formula D-1 or D-2 below, Rrepresents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, Arepresents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100. 

Surfactant composition

The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). Rrepresents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100. 

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Kyoto, Japan

Kei Shiohara