Daikin Industries, Ltd.

Kei Kuramoto

Tatsuya Takakuwa

Osamu Yamamoto

Katsuki Fujiwara

Yuuta Hasumoto

Kazuhiro Takahashi

Mitsushi Itano

Shun Ohkubo

The present disclosure provides a method for producing a reaction gas containing R-1132(E) with selectivity higher than that of known methods. Specifically, the present disclosure provides a method for producing a reaction gas containing (E)-1,2-difluoroethylene (R-1132(E)), (1) the method comprising a step of subjecting a starting material gas containing one or more fluoromethanes selected from the group consisting of chlorodifluoromethane (R-22), difluoromethane (R-32), and fluoromethane (R-41) to a reaction that involves thermal decomposition to obtain the reaction gas, and (2) the starting material gas having a water vapor content of 1 volume % or less.

Method for producing reaction gas containing (E)-1,2-difluoroethylene

The present disclosure provides a composition comprising a refrigerant characterized by having a GWP lower than that of R410A and a COP equivalent to that of R410A. Specifically, the present disclosure provides a composition comprising a refrigerant, the refrigerant comprising CO(R744) and at least one compound A selected from the group consisting of trans-1,2-difluoroethylene [(E)-HFO-1132], cis-1,2-difluoroethylene [(Z)-HFO-1132], fluoroethylene (HFO-1141), and 3,3,3-trifluoropropyne (TFP).

Composition containing coolant, heat transfer medium and heat cycle system

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Osaka, Japan

Kei Kuramoto