Tokyo Shibaura Denki Kabushiki Kaisha

Kei Kirita

Toshiaki Shinozaki

Kinya Usuda

Takashi Tsuchiya

Fumiaki Shigemitsu

Yoshihide Kato

Katuo Koike

A method for forming a highly precise resist pattern with good reproducibility has the steps of: applying a resist material to a substrate to form a resist film; baking the resist film; cooling the resist film in a controlled manner; selectively irradiating the resist film with one of electromagnetic waves in a predetermined wavelength range and particle beam having predetermined energy; and developing the resist film to form a resist pattern.

Method and apparatus for forming resist pattern

A method for forming a highly precise resist pattern with good reproducibility has the steps of: applying a resist material to a substrate to form a resist film; baking the resist film; cooling the resist film in a controlled manner; selectively irradiating the resist film with one of the electromagnetic waves in a predetermined wavelength range and particle beam having predetermined energy; and developing the resist film to form a resist pattern.

The invention provides a method for producing metal ions, having the steps of: producing a gas containing a metal element by evaporation of a liquid organic metal compound; introducing the gas containing the metal element and an auxiliary gas for cleaning into the ionization chamber; and producing the metal ions by ionizing the metal element by a discharge. According to this method, the metal ions are produced easily and quickly with good controllability.

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Tokyo, Japan

Kei Kirita