Tokyo Gas Company Limited

Fujikura Limited

Hitachi Cable, Inc.

International Superconductivity Technology Center

Hokkaido Electric Power Company, Inc.

Kei Kikuchi

Shoji Tanaka

Kenichi Nakamura

Yuh Shiohara

Takahiro Ide

Atsushi Kume

Noriyuki Tatsumi

Jiro Tsujino

Shigenori Yuhya

Yuichiro Okajima

A gas sensor including a substrate, a heater formed on said substrate, and a gas sensing material to be heated by said heater, wherein the area of the substrate under the heater is removed or reduced in its thickness to form a cavity. The thickness of the layer of the gas sensing material is reduced gradually toward the peripheral of the gas sensing material.

Thin film deposition method and gas sensor made by the method

The generation of a reaction product is suppressed between a metallic substrate and plasma in depositing a ceramic intermediate layer on the metallic substrate in a process for depositing an oxide film on the metallic substrate by thermal plasma flash evaporation method. Thus, there is no reaction phase in the ceramic intermediate layer and the metallic substrate, and an intermediated buffer layer of only oxide ceramic is deposited on a flat surface of the metallic substrate. The intermediate ceramic layer is deposited in inert atmosphere of a low oxygen concentration at a temperature of less than 600.degree. C. for the metallic substrate. Then, a superconducting thin film is deposited on the ceramic intermediate layer.

Process for depositing oxide film on metallic substrate by heat plasma

Growing community of inventors

Kanagawa, Japan

Kei Kikuchi