United Microelectronics Corp.

Faraday Technology Corporation

Industrial Technology Research Institute

Kei-Kang Hung

Ming-Dou Ker

Tien-Hao Tang

Chien-Hui Chuang

Shao-Chang Huang

Chyh-Yih Chang

Hsin-Chin Jiang

Hung-Yi Chang

A non-gated diode structure of a silicon-on-insulator, having a silicon-on-insulator substrate, a pair of isolating structures, a first type doped region and a second type doped region. The silicon-on-insulation substrate has a stack of a substrate, an insulation layer and a silicon layer. The isolating structures are located in the silicon layer to define a well region. The first and second type doped regions are located in the well and are adjacent to the isolating structures. Such a non-gated diode structure can be applied to an electrostatic discharge protection circuit to increase the electrostatic discharge protection voltage or current. In addition, a fabrication method of the non-gated diode is also introduced. This non-gated diode can be also fabricated in the general bulk CMOS process, and used in the on-chip ESD protection circuits.

Electrostatic discharge protection circuit of non-gated diode and fabrication method thereof

A silicon-on-insulator (SOI) gated diode and non-gated junction diode are provided. The SOI gated diode has a PN junction at the middle region under the gate, and which has more junction area than a normal diode. The SOI non-gated junction diode has a PN junction at the middle region thereof, and then also has more junction area than a normal diode. The SOI diodes of the present invention improve the protection level offered for electrical overstress (EOS)/electrostatic discharge (ESD) due to the low power density and heating for providing more junction area than normal ones. The I/O ESD protection circuits, which comprise primary diodes, a first plurality of diodes, and a second plurality of diodes, all of which are formed of the present SOI diodes, could effectively discharge the current when there is an ESD event. And, the ESD protection circuits, which comprise more primary diodes, could effectively reduce the parasitic input capacitance, so that they can be used in the RF circuits or HF circuits. The proposed gated diode and non-gated diode can be fully process-compatiable to general partially depleted or fully-depleted silicon-on-insulator CMOS processes.

Silicon-on-insulator diodes and ESD protection circuits

A silicon-on-insulator (SOI) gated diode and non-gated junction diode are provided. The SOI gated diode has a PN junction at the middle region under the gate, which has more junction area than a normal diode. The SOI non-gated junction diode has a PN junction at the middle region thereof, and also has more junction area than a normal diode. The SOI diodes of the present invention improve the protection level offered for electrical overstress (EOS)/electrostatic discharge (ESD) due to the low power density and heating for providing more junction area than normal ones. The I/O ESD protection circuits, which comprise primary diodes, a first plurality of diodes, and a second plurality of diodes, all of which are formed of the present SOI diodes, could effectively discharge the current when there is an ESD event. And the ESD protection circuits, which comprise more primary diodes, could effectively reduce the parasitic input capacitance, so that they can be used in the RF circuits or HF circuits. The proposed gated diode and non-gated diode can be fully process-compatiable to general partially-depleted or fully-depleted silicon-on-insulator CMOS processes.

A silicon-on-insulator low-voltage-triggered silicon controlled rectifier device structure that is built upon a substrate and an insulation layer. The insulation layer has a plurality of isolation structures thereon to define a device region. A first-type well and a second-type well are formed over the insulation layer. The first-type and second-type wells are connected. A first gate and a second gate are formed over the first-type well and the second-type well, respectively. The first-type well further includes a first second-type doped region and a first first-type doped region formed between the first second-type doped region and the isolation structure adjacent to the first second-type doped region. The first second-type doped region and the first first-type doped region together form a cathode of the SOI-SCR device. A second first-type doped region is formed within the first-type well between the first second-type doped region and the first gate structure adjacent to the first second-type doped region. A third first-type doped region is formed within the first and the second-type well around their junction between the first and second-type well. The second-type well further includes a second second-type doped region and a fourth first-type doped region within the second-type well between the second second-type doped region and the second gate adjacent to the second second-type doped region. The second second-type doped region and the fourth first-type doped region together form an anode of the SOI-SCR device.

Low-voltage-triggered SOI-SCR device and associated ESD protection circuit

A silicon-on-isolator CMOS integrated circuit device includes a semiconductor substrate, an isolation layer formed over the semiconductor substrate, an n-type MOS transistor having a gate, a drain region, and a source region formed over the isolation layer, and a p-type MOS transistor having a gate, a drain region, and a source region formed over the isolation layer and contiguous with the n-type MOS transistor, wherein the n-type MOS transistor and the p-type MOS transistor form a silicon controlled rectifier to provide electrostatic discharge protection.

SCR devices in silicon-on-insulator CMOS process for on-chip ESD protection

An integrated circuit that includes a signal pad, a clamping circuit including a first NMOS transistor having a drain, a source, a gate and a substrate, wherein the drain of the first NMOS transistor is coupled to the signal pad and the source of the first NMOS transistor is coupled to ground, and a control circuit coupled to the gate and substrate of the first NMOS transistor and the signal pad, the control circuit providing a first bias voltage signal to the gate and a second bias voltage signal to the substrate. The voltage level of the first bias voltage signal may be equal to, greater than, or less than the second bias voltage signal. By independently optimizing the trigger levels of the substrate and gate of the transistor in the clamping circuit, a robust ESD protection circuit can be obtained to suit the requirements of different process technologies.

Dual-triggered electrostatic discharge protection circuit

A power-rail ESD (electrostatic discharge) protection circuit with a dual trigger design is proposed, which is coupled between a first power line and a second power line connected to an IC device for protecting the IC device against ESD on the first power line and the second power line. The proposed power-rail ESD protection circuit comprises a control circuit and at least one MOS device. The control circuit is coupled between the first power line and the second power line, and which is capable of, in the event of ESD in the first power line and the second power line, being triggered by the ESD to output a substrate-triggering voltage and a gate-driving voltage to the MOS device, causing the MOS device to bypass the ESD current from the first power line and the second power line. The circuit configuration of the proposed power-rail ESD protection circuit can help reduce the junction breakdown voltage in a MOS device and increase in ESD robustness.

Power-rail electrostatic discharge protection circuit with a dual trigger design

A low capacitance electrostatic discharge circuit (ESD) for a built-in CMOS chip capable of protecting an internal circuit within the chip. A first voltage source and a second voltage source are provided to the electrostatic protection circuit. The ESD circuit is coupled to a bonding pad and the internal circuit. The ESD protection circuit includes a first diode series, a second diode series, a first control circuit, a third diode series, a first silicon-controlled rectifier (SCR), a second control circuit, a fourth diode series and a second SCR. The ESD circuit utilizes the control circuits to initiate substrate triggering so that the triggered voltage of the SCR is lowered and holding voltage of the SCR during conduction in increased. Consequently, the entire chip is protected and input capacitance of the circuit is reduced.

CMOS whole chip low capacitance ESD protection circuit

An ESD protection circuit, arranged between a first and second potential terminals, has a RC branch, a voltage adjuster circuit, and an ESD discharge transistor. The RC branch includes a resistor and a capacitor series connected from the first to the second potential terminal. The voltage adjuster circuit has a plurality of inputs connected to the RC branch, and the first and second potential terminals, and an output connected to a gate of the ESD discharge transistor to adjust the gate voltage thereof for obtaining a uniform turn on and optimal ESD robustness. The voltage adjuster circuit mainly includes a plurality of transistors that enable to effectively adjust the gate voltage with respect to high level of ESD stress.

Effective gate-driven or gate-coupled ESD protection circuit

A double-triggered electrostatic discharge (ESD) protection circuit for coupling with a first voltage source and a second voltage source. The circuit includes a diode series and a transistor. The diode series comprises a plurality of serially connected diodes with the cathode of one diode connected to the anode of a subsequent diode. The positive terminal of the first diode in the diode series connects with the first voltage source. The gate terminal of the transistor connects with the anode of the last diode in the diode series. The substrate of the transistor connects with the cathode of the last diode in the diode series. The source terminal and the drain terminal of the transistor connect with the first voltage source and the second voltage source, respectively. By using double-triggered design, the ESD clamp device can be quickly triggered on to bypass ESD current. Therefore, the ESD protection circuit has a better protection capability to protect the IC in deep-submicron CMOS technologies against ESD damage.

Double-triggered electrostatic discharge protection circuit

A silicon-on-insulator (SOI) gated diode and non-gated junction diode are provided. The SOI gated diode has a PN junction at the middle region under the gate, and which has more junction area than a normal diode. The SOI non-gated junction diode has a PN junction at the middle region thereof, and then also has more junction area than a normal diode. The SOI diodes of the present invention improve the protection level offered for electrical overstress (EOS)/electrostatic discharge (ESD) due to the low power density and heating for providing more junction area than normal ones. The I/O ESD protection circuits, which comprise primary diodes, a first plurality of diodes, and a second plurality of diodes, all of which are formed of the present SOI diodes, could effectively discharge the current when there is an ESD event. And, the ESD protection circuits, which comprise more primary diodes, could effectively reduce the parasitic input capacitance, so that they can be used in the RF circuits or HF circuits. The proposed gated diode and non-gated diode can be fully process-compatiable to general partially-depleted or fully-depleted silicon-on-insulator CMOS processes.

A silicon-on-insulator (SOI) gated diode and non-gated junction diode are provided. The SOI gated diode has a PN junction at the middle region under the gate, thus providing more junction area than a normal diode. The SOI non-gated junction diode has a PN junction at the middle region thereof, and thus also has more junction area than a normal diode. The SOI diodes of the present invention improve the protection level offered for electrical overstress (EOS)/electrostatic discharge (ESD) due to the low power density and heating for providing more junction area than normal ones. The I/O ESD protection circuits, which comprise primary diodes, a first plurality of diodes, and a second plurality of diodes, all of which are formed of the present SOI diodes, could effectively discharge the current when there is an ESD event. And, the ESD protection circuits, which comprise more primary diodes, could effectively reduce the parasitic input capacitance, so that they can be used in the RF circuits or HF circuits. The proposed gated diode and non-gated diode can be fully process-compatible to general partially-depleted or fully-depleted silicon-on-insulator CMOS processes.

An electrostatic discharge (ESD) protection circuit for protecting input and output buffers. The ESD protection circuit is driven by a first voltage source and a second voltage source and coupled to a bonding pad. The ESD protection circuit has a first resistor, a first PMOS transistor, a first NMOS transistor, a first diode series, a second PMOS transistor, a second resistor, a third PMOS transistor, a second NMOS transistor, a second diode series and a third NMOS transistor. The electrical devices combine to form different types of ESD protection circuits, each capable of protecting the input buffer or output buffer against the damaging effects of an electrostatic discharge.

Electrostatic discharge protection circuit for protecting input and output buffer

A semiconductor device with substrate-triggered ESD protection technique includes a guard ring, a first MOS transistor array, a second MOS transistor array and a substrate-triggered portion. The first MOS transistor array, the second MOS transistor array and the substrate-triggered portion are formed in a region surrounded by the guard ring, and the substrate-triggered portion is located between the first MOS transistor array and the second MOS transistor array. Therefore, when the ESD event occurs, the substrate-triggered portion can be used for biasing a base of at least one parasitic BJT in the first MOS transistor array and a base of at least one parasitic BJT in the second MOS transistor array to achieve uniform turn-on among the multiple fingers of MOS transistor array. By using this layout design, the MOS transistor array can have a high ESD robustness.

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Kei-Kang Hung