Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Asml Netherlands B.v.

Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek

Kees Moddemeijer

Erwin John Van Zwet

Adrianus Johannes Petrus Maria Vermeer

Anastasius Jacobus Anicetus Bruinsma

Frank Leonard Kooi

Pieter Johannes Marius Van Groos

James Peter Robert Day

Daniel Perez Calero

Marijn Sandtke

Tom Duivenvoorde

Léon Van Dooren

Folkert Draaisma

Jan Frederick Hoogkamp

Alexander Hans Wertheim

The present disclosure concerns a spectrometer () and method for generating a two dimensional spectrum (S). The spectrometer () comprises a main grating () and cross dispersion element (). An imaging mirror () is arranged for reflecting and focussing dispersed radiation (R) from the main grating () towards an image plane (IP) for imaging the two dimensional spectrum (S) onto an image plane (IP) of the spectrometer (). A correction lens () is arranged for correcting optical aberrations in the imaging of the two dimensional spectrum (S) in the image plane (IP). The imaging mirror () and correction lens () have a coinciding axis of cylindrical symmetry (AS).

Spectrometer for generating a two dimensional spectrum

According to an aspect of the invention, there is provided a chip diemanipulator apparatus arranged for picking and placing of a chip diein a chip manufacturing process, wherein an imaging systemcomprising an arc form convex spherical mirrorarranged at a second off-axis position B and centered relative to the center position; a folding mirrorarranged in a light path between the convex spherical mirrorand the center positionfor folding the light path to a third off-axis position C; and an arc form concave spherical mirrorarranged at the third off-axis position C having a curvature to image from at least one of the center positionand the componenton the image detection system. The imaging systemcorrects for the angled image detection of the center position

System and method for picking and placement of chip dies

A lithographic apparatus transfers a pattern from a patterning device onto a substrate and includes a projection system to project a patterned radiation beam onto the substrate; a controllable actuator to adjust a distance between the projection system and the substrate; and a particle detector system to detect a particle on a surface of the substrate. The particle detector system has illumination optics directing the radiation to a detection area of the surface of the substrate, detection optics receiving radiation from the detection area of the surface of the substrate, and a detector coupled to the detection optics to produce a measurement signal. The apparatus further has a processing system to determine the height of a particle from the measurement signal, generate a height excess signal if the height exceeds a threshold value, and control the actuator in response to the height excess signal.

Detector system for detecting a height of a particle, and lithographic apparatus and device manufacturing method including the same.

Visual prominence meter

Growing community of inventors

Leiden, Netherlands

Kees Moddemeijer