Kabushiki Kaisha Toyota Chuo Kenkyusho

Toyota Jidosha Kabushiki Kaisha

Jtekt Corporation

Kabushiki Kaisha Toyota Jidoshokki

Kazuyuki Nakanishi

Hideo Tachikawa

Hiroyuki Mori

Takashi Iseki

Tadashi Oshima

Yuka Yamada

Toshiyuki Saito

Junji Ando

Takao Kobayashi

Yasuhiro Ozawa

Minoru Kawasaki

Naoyuki Sakai

Masafumi Koizumi

Hideo Hasegawa

Toshifumi Sakai

Naoki Ueda

Hajime Fukami

Hiromasa Takeda

Munehisa Matsui

Ken-ichi Suzuki

Yoshiyuki Funaki

Takayuki Kato

Takayuki Kikuchi

Hajime Hasegawa

Takahiro Sugioka

Tohru Arai

Hitotoshi Murase

Seiji Mizuno

Yasushi Yamada

Shingo Ohta

Koji Nishi

Fumio Shimizu

Hiroyuki Ueda

Mamoru Tohyama

Toshio Horie

Atsushi Saito

Toshihide Ohmori

Masayasu Ishiko

Masaru Okuyama

Katsumi Sato

Hirohiko Hisano

Gaku Kitahara

Kuroudo Maeda

Shintaro Igarashi

Hideoki Fukushima

Shuichi Yasuda

Yukio Miyachi

Masahiro Suzuki

Yoshinari Tsuchiya

Kyouji Itou

Mikio Fujioka

Katsutoshi Fujisawa

Kyouji Kondo

Ken-Ichi Suzuki

An amorphous carbon film contains carbon as a main component, not more than 30 at. % of hydrogen, not more than 20 at. % of nitrogen and not more than 3 at. % of oxygen (all excluding 0 at. %), and when the total amount of the carbon is taken as 100 at. %, the amount of carbon having an sphybrid orbital is not less than 70 at. % and less than 100 at. %. Nitrogen and oxygen are concentrated on a surface side of the film and when detected from a surface layer by X-ray photoelectron spectroscopy, oxygen content ratio is not less than 4 at. % and not more than 15 at. % and nitrogen content ratio is not less than 10 at. % and not more than 30 at. %.

Amorphous carbon film, process for forming amorphous carbon film, electrically conductive member and fuel cell bipolar plate having amorphous carbon film

The oriented amorphous carbon film contains C as a main component, 3 to 20 at. % of N, and more than 0 at. % and not more than 20 at. % of H, and when the total amount of the C is taken as 100 at. %, the amount of C having an sphybrid orbital (Csp) being not less than 70 at. % and less than 100 at. %, and (002) planes of graphite being oriented along a thickness direction. This film has a novel structure and exhibits a high electric conductivity. This film can be formed by DC plasma CVD method in which an electric discharge is generated by applying a voltage of not less than 1500 V to reaction gas including at least one kind of compound gas selected from gas of a carbocyclic compound containing Cspand gas of an N-containing heterocyclic compound containing Csp, and nitrogen and/or silicon, and nitrogen gas.

Oriented amorphous carbon film and process for forming the same

A bipolar plate for a fuel cell comprises a substrate formed of stainless steel; an oriented amorphous carbon film formed at least on a surface of the substrate facing an electrode, and containing C as a main component, 3 to 20 at. % of N, and more than 0 at. % and not more than 20 at. % of H, and when the total amount of the C is taken as 100 at. %, the amount of C having an sphybrid orbital (Csp) being not less than 70 at. % and less than 100 at. %, and (002) planes of graphite being oriented along a thickness direction; a mixed layer generated in an interface between the substrate and the oriented amorphous carbon film and containing at least one kind of constituent atoms of each of the substrate and the oriented amorphous carbon film; and a plurality of projections protruding from the mixed layer into the oriented amorphous carbon film and having a mean length of 10 to 150 nm.

Bipolar plate for fuel cell and method for producing the same

This invention adopts plasma-enhanced chemical vapor deposition using the apparatus including a chamber, a pair of rotary electrode reels including a feed-out reel and a take-up reel, a plasma source, a material gas supplier, and an exhaust unit, and includes applying a negative voltage applied to the rotary electrode reels from the plasma source while a conductive substrate is fed-out from the feed-out reel and is wound on the take-up reel so that the entire surface of the substrate portion between reels contacts the material gas, whereby plasma sheath is formed along the surface of the substrate portion between reels, and the material gas is activated in the plasma sheath and thus contacts the surface of the substrate, thus forming the film on the surface of the substrate.

Method and apparatus for forming film

A method of manufacturing a titanium-based material includes: rolling a titanium base material via rolling oil that includes carbon to form a rolling-altered layer that includes titanium carbide on a surface of the base material; and depositing a carbon film on the surface on which the rolling-altered layer has been formed.

Titanium-based material, method of manufacturing titanium-based material, and fuel cell separator

The amorphous carbon film of the present invention is an amorphous carbon film comprising carbon and hydrogen, wherein the amorphous carbon film contains not more than 30 atomic % (excluding 0%) of hydrogen and, when the entire amount of the carbon is taken as 100 atomic %, carbon having an sphybrid orbital is present in an amount of not less than 70 atomic % and less than 100 atomic %. Conductivity is imparted to an amorphous carbon film by controlling the contents of hydrogen, Cspand the like to increase a structure comprising Csp. This amorphous carbon film can be formed by plasma CVD using a reaction gas containing one or more gases selected from a carbocyclic compound gas containing carbon having an sphybrid orbital, and a heterocyclic compound gas containing carbon having an sphybrid orbital and silicon and/or nitrogen. By forming the amorphous carbon film on a surface of a substrate, a conductive member can be obtained.

Amorphous carbon film, process for forming amorphous carbon film, conductive member provided with amorphous carbon film, and fuel cell separator

While securing the building-up ability and crack resistance, to provide a build-up wear-resistant copper alloy and valve seat. The build-up wear-resistant copper alloy and valve seat are characterized by having a composition of nickel: 5.0-24.5%, iron: 3.0-20.0%, silicon: 0.5-5.0%, boron: 0.05-0.5%, chromium: 0.3-5.0%, one member or two members or more selected from the group consisting of molybdenum, tungsten and vanadium: 3.0-20.0%, by weight %, and the balance being copper and inevitable impurities.

Build-up wear-resistant copper alloy and valve seat

An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sphybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.

Amorphous carbon film, process for forming the same, and high wear-resistant sliding member with amorphous carbon film provided

This is to provide a build-up wear-resistant copper-based alloy, which is advantageous for enhancing the cracking resistance and machinability, which is appropriate for cases of building up to form built-up layers especially, and which is equipped with the wear resistance, cracking resistance and machinability combinedly in a well balanced manner. A build-up wear-resistant copper-based alloy is characterized in that it has a composition, which includes nickel: 5.0-20.0%; silicon: 0.5-5.0%; manganese: 3.0-30.0%; and an element, which combines with manganese to form a Laves phase and additionally to form silicide: 3.0-30.0%; by weight %, and inevitable impurities; and additionally the balance being copper. The element can be one member or two or more members of titanium, hafnium, zirconium, vanadium, niobium and tantalum.

Build-up wear-resistant copper-based alloy

A friction clutch includes an iron inner clutch plate and two iron outer clutch plates. Each clutch plate has a sliding surface that friction-engages with the other clutch plates. A diamond-like carbon film containing silicon, which functions as a solid lubricant, is formed on the sliding surface of each outer clutch plate through a conventional method such as plasma chemical vapor deposition. The diamond-like carbon film contains 1 wt % to 80 wt % of silicon. A coupling device includes a pilot clutch mechanism that has the friction clutch and an electromagnetic actuator. As a result, the friction clutch has an improved resistance to wear, and the coupling device is durable.

Clutch plate, friction clutch, and coupling device

An amorphous carbon film forming apparatus according to the present invention is characterized by being provided with a film forming furnace; plural workpiece fixturesfor supporting plural plate-like workpiecesin a state that the same are piled up vertically in parallel with the interval between facing surfaces of two vertically adjoining of the plate-like workpiecesbeing in a range of 2 to 30 millimeters, the plural workpiece fixturesbeing arranged within the film forming furnaceat a regular angular interval on a circle and being connected to a negative electrode; nozzlesprovided for supplying a processing gas and including at least one nozzle arranged at a center of the circle on which the plural workpiece fixturesare arranged and plural nozzles arranged at a regular angular interval on another circle which surrounds the workpieces fixturesradially outside thereof; and a plasma power supply connected to at least the workpiece fixtures. By controlling the supply gas pressure to be in a range of 13 to 1,330 Pa and a sheath width to be made in a range of 2 to 30 mm, the discharge is kept stably. As a consequence, it can be realized to form amorphous carbon films efficiently at a low cost.

Amorphous carbon film forming method and device

To provide a sliding member that exhibits excellent durability and is free of lead. A swash plate for a compressor as the sliding member of the invention contains a base material having on the surface thereof a sliding layer constituting at least a sliding surface, on which shoes slide. The sliding layer contains a first layer that contains an amorphous hard carbon (diamond-like carbon) film containing Si (DLC-Si film) and is formed on the base material, and a second layer that is formed on the first layer and contains polyamideimide (PAI) containing a solid lubricant such as MoS.

Sliding member

A drive force transmission device has an outer clutch plate and an inner clutch plate, which are rotatable relative to each other about a common rotational axis. The inner and outer clutch plates become frictionally engaged with each other with lubricant oil provided in between. The outer and inner clutch plates each have a sliding surface. The sliding surfaces face each other. A diamond-like carbon film is formed on the sliding surface of the outer clutch plate. Fine grooves are formed in the sliding surface of the inner clutch plate. The proportion of the sliding area to the sliding surface of the inner clutch plate at the initial stage of use is 55 to 90%.

Drive force transmission device

Under wet sliding conditions using drivetrain system lubricating oils, a high frictional sliding member exhibiting a high friction coefficient, a favorable &#x3bc;&#x2212;v characteristic stably, excellent wear resistance, and low mating-member aggressiveness is provided. The present invention is a wet sliding member comprising: a substrate composed of metal, ceramics, or resin; and an amorphous hard carbon film formed integrally on a surface of the substrate, having a surface, at least a part of which is turned into a sliding surface for sliding under wet conditions, and containing at least either one of Si and N in an amount of from 1 to 50 atomic %.

High friction sliding member

This aims to provide a wear-resistant copper-based alloy, which is advantages in not only enhancing wear resistance in a high temperature range but also enhancing crack resistance and machinability and which is especially suitable for forming a cladding layer. The wear-resistant copper-based alloy comprises, by weight, 4.7 to 22.0% nickel, 0.5 to 5.0% silicon, 2.7 to 22.0% iron, 1.0 to 15.0% chromium, 0.01 to 2.00% cobalt, 2.7 to 22.0% one or more of tantalum, titanium, zirconium and hafnium, and the balance of copper with inevitable impurities.

Wear-resistant copper-based alloy

Growing community of inventors

Seto, Japan

Kazuyuki Nakanishi