Canon Kabushiki Kaisha

Kazuyuki Kasumi

Eigo Kawakami

Toshinobu Tokita

Hirohisa Ota

Takashi Nakamura

Shingo Okushima

Junichi Seki

Nobuhito Suehira

Yutaka Watanabe

Takeshi Miyachi

Hideki Ina

Shinichi Hara

Yuji Chiba

Yutaka Tanaka

Naoto Abe

Ryuichi Ebinuma

Mitsuaki Amemiya

Nobutoshi Mizusawa

Shigeru Terashima

Kazunori Iwamoto

Takayuki Hasegawa

Tetsuzo Mori

Mitsuji Marumo

Kouhei Imoto

Toru Hirabayashi

Takao Miura

An LED light source module includes a circuit board, solid-state light emitting elements arranged on the circuit board, a heatsink disposed in contact with the circuit board and having a channel formed inside, through which refrigerant flows, and a switching unit configured to switch a flow direction of refrigerant through the channel to an opposite direction.

Light source device, cooling method, and manufacturing method for product

A method in which alignment control of a member and a substrate is effected with respect to an in-plane direction of the substrate and an uncured material in a state of bringing a member and the uncured material on a substrate into contact with each other is cured. The method includes a step of bringing the member and the substrate near to each other while effecting the alignment control, based on a driving profile, after the alignment control is started, to bring the member and the uncured material into contact with each other, and then the uncured material is cured, and a step of increasing a gap between the member and the substrate, after the uncured material is cured, wherein the driving profile for the alignment control after the alignment control is started and at least one of before and after the member contacts the uncured material is changed.

Method in which alignment control of a member and a substrate is effected with respect to an in-plane direction of the substrate and an uncured material in a state of bringing a member and the uncured material on a substrate into contact

An imprint apparatus forms a pattern of an imprint material on a substrate by using a mold, while effecting alignment control of a mold and a substrate with respect to an in-plane direction of the substrate. A mold holding portion holds the mold. A substrate holding portion holds the substrate. A control portion effects control so that the mold and the substrate are brought near to each other while effecting the alignment control, based on a driving profile, after the alignment control is started, to bring the mold and the imprint material into contact with each other. The imprint material is then cured. The control portion changes the driving profile for the alignment control after the alignment control is started and at least one of before and after the mold contacts the imprint material.

Imprinting apparatus for producing a member in which a mold contacts a pattern forming layer using alignment control in an in-plane direction of a substrate

An imprint apparatus performs alignment control of a mold and a substrate. A pattern formed on the mold is transferred onto a pattern forming layer on the substrate. A mold holding portion holds the mold, a substrate holding portion holds the substrate, and a control portion effects control so that the mold and the substrate are brought near to each other during the alignment control. The mold and the pattern forming layer are brought into contact with each other and then the pattern forming layer is cured. The control portion changes a driving profile for the alignment control after the alignment control is started and at least one of before and after the mold contacts the pattern forming layer. The driving profile used to move at least one of the mold holding portion and the substrate holding portion to a target position, and includes at least one of acceleration, speed, driving voltage, and driving current.

Imprint apparatus in which alignment control of a mold and a substrate is effected

An imprinting method in which alignment control of a mold and a substrate is effected and a pattern formed on the mold is transferred onto a pattern forming layer provided on the substrate. The imprinting method includes a step in which the mold and the substrate are brought near to each other while effecting the alignment control, after the alignment control is started, to bring the mold and the pattern forming layer into contact with each other, and then, the pattern forming layer is cured, and a step in which the gap between the mold and the substrate is increased, after the pattern forming layer is cured. Further, the alignment control is stopped after the alignment control is started, and at least one of before and after the mold contacts the pattern forming layer.

Imprinting method and process for producing a member in which a mold contacts a pattern forming layer

There is provided an imprint apparatus configured to perform an imprint in which a resin on a substrate is molded using a mold and a pattern is formed on the substrate. The apparatus includes a press unit configured to press the resin on the substrate and the mold to each other, a cure unit configured to irradiate light to the resin molded by the mold to cure the resin, and a movement unit configured to move the mold and the substrate, from a position at which the press is performed by the press unit to a position at which the light is irradiated by the cure unit, and from the position at which the light is irradiated by the cure unit to a position at which the mold is released.

Imprint apparatus, imprint method, and article manufacturing method

The imprint apparatus presses resin disposed on a substrate and a mold to each other to form a resin pattern on the substrate. The apparatus includes a driving device configured to move the mold and the substrate relatively to apply a pressing force between the mold and the resin, a measuring device configured to measure a position of at least one of the mold and the substrate, a detector configured to detect the pressing force, and a controller configured to control the driving device. The controller is configured to control the driving device using the position as a controlled variable in a first period, and to control the driving device using the pressing force as a controlled variable in a second period after the first period.

Imprinting apparatus and article manufacturing method

An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object.

Imprinting machine and device manufacturing method

A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area.

Pattern transferring apparatus and pattern transferring method

The present invention provides a holding apparatus for holding an optical element with an edge whose thickness increases or decreases inwardly, the apparatus including a barrel having an internal diameter larger than an external diameter of the optical element, a support configured to support and position the optical element relative to the barrel via a first surface of the edge in a direction of an axis of the barrel, and a restriction device including a regulation member which faces a second surface of the edge opposite to the first surface in the direction of the axis, is apart from the second surface if an amount of decentering of the optical element is less than a predetermined amount within a tolerance, and contacts with the second surface if the amount of decentering reaches the predetermined amount, and configured to restrict decentering of the optical element.

Holding apparatus, optical apparatus, and telescope

An imprint apparatus molds resin dispensed on a shot region of a substrate with a mold and forms a pattern of resin on the shot region. The apparatus includes a mold stage configured to hold the mold, a substrate stage configured to hold the substrate, a drive mechanism configured to change a relative positional relationship between the mold stage and the substrate stage in an X-Y plane that defines a coordinate of the shot region and a Z-axis direction perpendicular to the X-Y plane, and a controller. The controller is configured to control the drive mechanism so that the mold and the shot region perform relative vibration, in the X-Y plane, with respect to a relative position where the mold and the shot region align, and a distance between the mold and the shot region decreases in the Z-axis direction in parallel with the vibration, and the resin is molded by the mold.

Imprint apparatus and article manufacturing method

A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, includes a supplier for supplying the resist between the substrate and the mold, and a recovery unit for recovering the resist.

Processing apparatus

A method of exhausting a gas in a chamber of a load-lock system having a first valve defining an opening for supplying a gas and a second valve defining an opening for conveyance of an article. The method includes a gas supplying step for supplying a gas heated by a heater into the chamber through the first valve, while the first valve and the second valve are kept open, a conveying step for conveying the article into the chamber while the second valve is kept open, and an exhausting step to be carried out after the gas supplying step and the conveying step are executed and the first and second valves are closed, to exhaust the gas inside the chamber while the first valve and the second valve are kept closed.

Load-lock technique

A processing method for transferring a relief pattern of a mold to a resist includes the steps of compressing the mold having the relief pattern against the resist on a substrate, irradiating an exposure light onto the resist through the mold, vibrating the mold and the substrate relative to each other during the irradiating step, and releasing the mold from the resist.

Growing community of inventors

Utsunomiya, Japan

Kazuyuki Kasumi