Hitachi, Ltd.

Kazuyuki Fujimoto

Tsuneaki Kamei

Katsuo Abe

Masao Mitani

Shigetoshi Hiratsuka

Tsuneyoshi Kawahito

Shigeru Kobayashi

Nobuo Nakagawa

Disclosed is a thermal printhead made of an insulating substrate, and a heat generating resistor layer formed on the substrate, and wherein the heat generating resistor layer is supplied with electric current. The heat generating resistor layer is made of Cr-Si-SiO alloy, and with the Cr, Si and SiO contents falling within a region defined by points A, B, C and D in a triangular diagram, where the points A, B, C and D are determined as follows:

Thermal printhead

Disclosed is a resistor made of an alloy consisting essentially of Cr, Si and SiO.

Resistor

A film forming method by plasma sputtering is provided to attain a composite film on a substrate. A target plate having metal materials in a different pattern is prepared in opposition to the substrate. A plasma is created by a planar magnetron sputtering electrode structure. The plasma is shifted magnetically on the target plate by at least three magnetically coupled magnetic poles to deposit the materials into a film with a uniform thickness and a desired composition on the substrate.

Film forming method

Growing community of inventors

Tokyo, Japan

Kazuyuki Fujimoto