Kokusai Electric Corporation

Hitachi-Kokusai Electric Inc.

Kazuyoshi Yamamoto

Kazuhide Asai

Kayoko Yashiki

Hidemoto Hayashihara

Hiroyuki Iwakura

Takayuki Kawagishi

Masanori Okuno

Hideki Horita

Toshihiko Yonejima

Kenichi Fujimoto

Mitsuru Fukuda

Yukio Miyata

Ryuichi Kaji

Tokunobu Akao

Toshiro Koshimaki

Osamu Ueda

Hideto Shimizu

Nobuhisa Makino

There is provided a technique that includes: a controller configured to execute a process recipe including a plurality of steps to perform a predetermined process on a substrate. The controller acquires device data, which includes at least one of a current value, a rotational speed, and a back pressure of a pump, in a specific step among the plurality of steps and compares an acquired value of the device data with a previously acquired value of the device data. The controller generates a notification if at least one of the following conditions is met: the acquired value for the current value is larger than the previously acquired value for the current value, the acquired value for the back pressure is larger than the previously acquired value for the back pressure, and the acquired value for the rotational speed is smaller than the previously acquired value for the rotational speed.

Substrate processing apparatus and recording medium

According to one aspect of the technique, there is provided a technique, including: a process chamber in which a substrate is processed; a memory that stores recipe information describing a procedure that executes the processing of the substrate, process data accumulated during the processing of a plurality of substrates, variation quality data calculated from the process data, and comparison data to be compared with the variation quality data; a monitor configured to monitor the process data; an analyzer configured to compare the variation quality data with the comparison data to obtain a reproduction index indicating a reproducibility of the comparison data, and calculate a correction value of setting information included in the recipe information when the reproduction index is smaller than a predetermined value; and a controller configured to be capable of correcting the setting information included in the recipe information with the correction value.

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

A substrate processing apparatus includes a device management controller including a parts management control part configured to monitor the state of parts constituting the apparatus, a device state monitoring control part configured to monitor integrity of device data obtained from an operation state of the parts constituting the apparatus, and a data matching control part configured to monitor facility data provided from a factory facility to the apparatus. The device management controller is configured to derive information evaluating the operation state of the apparatus based on a plurality of monitoring result data selected from a group consisting of maintenance timing monitoring result data acquired by the parts management control part, device state monitoring result data acquired by the device state monitoring control part, and utility monitoring result data acquired by the data matching control part.

Substrate processing apparatus, device management controller, and recording medium

There is provided a configuration that includes: a main controller configured to, when executing a process recipe including a specific step of executing a sub-recipe, control a process controller to execute the sub-recipe a predetermined number of times to perform a predetermined process to a substrate: and a device management controller configured to collect device data during an execution of the process, recipe and store the device data in a storage part. The device management controller is further configured to: search the storage part; acquire the device data in a designated step among respective steps constituting the sub-recipe for a number of times of execution of the sub-recipe; calculate a first standard deviation of the device data acquired for the number of times of execution; and compare the first standard deviation with a threshold value and generate an alarm when the first standard deviation exceeds the threshold value.

Substrate processing apparatus, method of monitoring abnormality of substrate processing apparatus, and recording medium

There is provided a technique that includes: a main controller configured to execute a process recipe including a plurality of steps to perform a predetermined process on a substrate so as to acquire device data when executing the process recipe; and a storage part configured to store the acquired device data, wherein the main controller is configured to: acquire the device data in a predetermined specific step among the steps constituting the process recipe; calculate a value of the acquired device data in the specific step; compare the calculated value with a value of the device data in the specific step calculated at a time of previous execution of the process recipe; and generate an alarm when the calculated value shows a predefined tendency.

A substrate processing apparatus includes an operating unit for transmitting apparatus data to a memory, the apparatus data being required while a recipe for processing a substrate is executed; and a data matching unit for comparing the apparatus data stored in the memory. When an error occurs in the substrate processing apparatus, the operating unit transmits data representing the error to the data matching unit. The data matching unit includes: a selection unit for selecting first apparatus data which was acquired when the recipe was executed without an occurrence of the error, and stored in the memory; an acquisition unit for acquiring first and second apparatus data from the memory, the first apparatus data being acquired when an error did not occur and the second apparatus data being acquired when an error occurred; and a calculation unit for comparing the first and second apparatus data and calculating a difference therebetween.

Substrate processing in a process chamber for semiconductor manufacturing and apparatus management controller with error analysis

There is provided a configuration that includes a device-status-monitoring controller that stores, in a storage section, device data generated by the apparatus; an analysis-support controller that acquires the device data related to abnormality analysis information from the storage section based on basic information that includes: information that defines an abnormal event, at least one of the device data corresponding to the abnormal event, and step information indicating a step where the at least one of the device data is generated; and recipe-specific information that includes at least a recipe name; and a display device that displays the device data related to the abnormality analysis information in a manner that goes back to a past time from a time when a latest recipe specified by the recipe name is executed.

Substrate processing apparatus and device management controller

There is provided a technique for detecting a fault of a device from an error in device data. According to the technique described herein, there is provided a substrate processing apparatus including: a pipe heater configured to heat a gas pipe; a temperature detecting unit provided at the pipe heater and configured to detect a temperature of the gas pipe; a control unit configured to control the pipe heater based on device data representing the temperature of the gas pipe measured by the temperature detecting unit by executing a process control program to adjust an electrical power applied to the pipe heater; a memory unit configured to store a monitored item table; and a device status monitoring unit configured to execute a device status monitoring program.

Substrate processing apparatus and non-transitory computer-readable recording medium

There is provided a configuration that includes a plurality of substrate processing apparatuses and a management device for managing the plurality of substrate processing apparatuses. Upon receiving information specifying a substrate processing apparatus as a reference and file information designating a predetermined device file, the plurality of substrate processing apparatuses transmits request data including first device information and first data information to the management device. Upon receiving the request data, the management device transmits the received request data to the reference substrate processing apparatus. The reference substrate processing apparatus creates response data including second data information responding to the first data information and transmits the created response data to the management device. Upon receiving the response data, the management device transmits the received response data to the plurality of substrate processing apparatuses. The plurality of substrate processing apparatuses acquires the second data information from the response data.

Substrate processing system, substrate processing apparatus and management device

A management apparatus includes: a manipulation & display unit including a user interface for selecting a reference device information, and configured to display: a difference between the device information obtained from the substrate processing device and the reference device information selected via the user interface; a content of the reference device information; and a content of the device information, and further configured to receive a command for modifying the device information; and a control unit configured to modify the device information based on the command received from the manipulation & display unit and configured to transmit a modified device information to the substrate processing device.

Management apparatus, substrate processing system and non-transitory computer-readable recording medium

A substrate processing system includes a substrate processing apparatus configured to process a substrate, and a management device configured to display specified information transmitted from the substrate processing apparatus on a display unit. The substrate processing apparatus includes a processing environment measuring unit configured to measure information on a substrate processing environment according to time and a trouble information notifying unit configured to notify information on a trouble of the substrate processing apparatus. The management device includes a storage unit configured to store measurement information measured by the processing environment measuring unit and notification information notified by the trouble information notifying unit. The display unit is configured to display the measurement information and the notification information which are stored in the storage unit and correlated with each other.

Substrate processing system, management device, and display method for facilitating trouble analysis

There is provided a substrate processing apparatus that can easily grasp the relationship of a defect substrate between plural batches. A substrate processing apparatusincludes: a display unit; a storage unit that accumulates and stores production information of the substrate for each batch, the production information being produced when the substrate is processed; a selection receiving unit that receives the selection of plural batches stored in the storage unit; and a display control unit that controls such that substrate information is displayed on the display part, the substrate information being information relating to a state in which the substrates are held the substrate holding part in the plural batches received by the selection receiving unit.

Substrate processing apparatus

A maintenance engineer can analyze an abnormal state with less difficulty in a rapid and correct manner independent of his/her skill. A substrate processing system comprises: a substrate processing apparatus configured to operate according to a recipe defining a process sequence and process conditions, and a group managing apparatus connected to the substrate processing apparatus. The group managing apparatus comprises an analysis support unit. The analysis support unit is configured to extract check item information relating to both abnormal state information for indentifying an abnormal state occurring when the recipe is executed and apparatus type information for identifying the type of the substrate processing apparatus at which the abnormal state occurs, and to prepare a check item table comprising the extracted check item information.

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Toyama, Japan

Kazuyoshi Yamamoto