Tokyo Electron Limited

Honda Motor Co., Ltd.

Tokyo Hy-Power Labs, Inc.

Honda Access Co., Ltd.

Kazuyoshi Watanabe

Shinji Himori

Masahide Iwasaki

Toshihiro Hayami

Mitsuhiro Yuasa

Hideo Ochiai

Katsumasa Mukai

Yuichi Sasaki

Jun'ichi Shimada

Junichi Takahira

Shinichi Komatsu

A plasma processing unit of the present invention includes a processing container whose inner pressure can be reduced, a first electrode arranged in the processing container, a process gas supplying unit that supplies a process gas into the processing container, a high-frequency electric power source that outputs high-frequency electric power having a frequency in a VHF band, a matching unit electrically connected to the high-frequency electric power source and the first electrode for impedance matching, and a transmission line that transmits the high-frequency electric power from the high-frequency electric power source to the matching unit. A substrate to be processed is adapted to be arranged in the processing container. The high-frequency electric power transmitted to the first electrode is adapted to generate plasma in such a manner that the substrate to be processed can undergo a plasma process by means of the plasma. The transmission line has a length shorter than a length wherein a resonance state of a third harmonic wave of the high-frequency electric power may be generated.

Plasma processing unit and high-frequency electric power supplying unit

A motorcycle saddlebag mounting device having a restricting means for staggering timings of yawing occurring in a motorcycle body and resonance caused by lateral swing of a saddlebag is provided. The restricting means is provided between a support bracket mounted to a seat rail and a saddlebag mounting frame rotatably mounted to the support bracket. Rotation of the frame with respect to the support bracket is restricted, so that resonance caused by yawing of the motorcycle body and lateral swing of the saddlebag is cancelled out.

Motorcycle saddlebag mounting device

There are provided a matching unit capable of sufficiently matching the impedance of a high frequency load to a transmission path impedance without increasing its size and matching time even if a high frequency power of 70 MHz or higher is supplied thereto, and a plasma processing system using the same. A matching unitcomprises: a resonance rodfor transmitting a high frequency energy from a high frequency power supplyto a plasma producing electrode; a variable capacitor, connected to the resonance rodand an electrodein series, for adjusting the imaginary part of an impedance complex number; a housingwhich is provided outside of the resonance rodand which is grounded; a link coilfor exciting a high frequency energy to the resonance rodand for adjusting the real part of the impedance complex number; and a controllerfor controlling a driving part for the variable capacitorand the link coilso that a series resonance circuit is formed between the high frequency power supplyand the ground via plasma in a matching state.

Matching unit and plasma processing system

Growing community of inventors

Niiza, Japan

Kazuyoshi Watanabe