Dainippon Screen Mfg. Co., Ltd.

Screen Holdings Co., Ltd.

Kazuya Ono

Tsuyoshi Mitsuhashi

Kenji Kamei

Masashi Kanaoka

Kazuya Akiyama

Atsushi Tanaka

Hidetoshi Sagawa

Masanori Imamura

Shinichi Takada

Kazuhiro Tadokoro

Taiji Matsu

A substrate treating method includes a determining step for determining a treating condition for hydrophobizing a surface of a substrate, based on a target regarding a dissolved area size in a resist pattern, and a treating step for hydrophobizing the surface of the substrate with the treating condition determined in the determining step before forming resist film on the surface of the substrate.

Substrate treating method

An edge exposing apparatus includes a photo detector and a lighting time measuring circuit for detecting a decrease in performance of light source units. The lighting time measuring circuit detects a ready state ((stabilization of luminous intensity) of the light source units, for example by measuring a lighting time for a startup (switch-on) of the light source units. When the measuring circuit detects a preset lighting time, or when the photo detector detects a luminous intensity below a preset value, the light source units are determined to have lowered performance, and are switched off. When a decrease in performance of one unit is detected, a replacement light source unit is started while continuing edge exposure with one or more other light source unit(s). When a ready state is detected, the edge exposure with the one light source unit is terminated (switch-off), and edge exposure is performed with the replacement light source unit.

Edge exposing apparatus

Growing community of inventors

Kyoto, Japan

Kazuya Ono