Canon Anelva Corporation

Kazutoshi Yoshibayashi

Masao Sasaki

Tatsunori Sato

Ryuji Higashisaka

Hiroshi Sone

Kenzou Murata

Kenji Sato

Tatsuhiro Takahashi

A heating apparatus includes a heater, an electron reflection plate, a filament arranged between the heater and the electron reflection plate, a heating power supply configured to supply an AC voltage between a first terminal and a second terminal of the filament to emit thermoelectrons from the filament, an acceleration power supply configured to supply an acceleration voltage between the filament and the heater, and a resistor arranged so as to form a path which connects the electron reflection plate and the heating power supply.

Heating apparatus, substrate heating apparatus, and method of manufacturing semiconductor device

A robot according to this invention includes a driving mechanism, a first arm rotatably connected to the driving mechanism, a second arm rotatably connected to the first arm, and an X-shaped end effector rotatably disposed at the distal end of the second arm. Of the four distal ends of the end effector, two distal ends include holding units which can hold substrates in one direction, and the remaining two distal ends include holding units which can hold substrates in the opposite direction.

Vacuum processing apparatus and substrate transfer method

Growing community of inventors

Kawasaki, Japan

Kazutoshi Yoshibayashi