Ebara Corporation

Kazutoshi Nagai

Hideaki Hayashi

Tohru Satake

Takanari Yasui

Yoshihiko Naito

Osamu Horita

Masahiro Hatakeyama

Tatsuya Nishimura

Kanichi Itoh

Yoshio Hatada

Kazuhiko Kaneko

An exhaust apparatus and a high vacuum pumping unit including such high vacuum device and an auxiliary vacuum pump are disclosed, wherein a high vacuum is achieved in a vacuum vessel such that the gas molecules within the vacuum vessel are ionized and accelerated to be exhausted and, further, in the high vacuum pumping unit, those gas molecules diffused back or desorbed from the vacuum pump are ionized and accelerated to be returned to the vacuum pump.

Exhaust apparatus and vacuum pumping unit including the exhaust apparatus

A magnetic field type mass spectrometer having an ion source, an ion accelerator, a mass separation magnet forming an analyzing part which changes the trajectory of ions by a magnetic field of the mass separation magnet, and a current detector, wherein the mass separation magnet is installed so that ions move along a trajectory which turns several times in the analyzing part, and repelling electrodes are installed at turning points of the ions, whereby ions generated from the ion source are caused to move along a trajectory which turns several times in the analyzing part. Mass separation is carried out along each trajectory, which provides high resolution.

Magnetic field type mass spectrometer

A compact mass spectrometer apparatus is presented to enable accurate qualitative and quantitative analyses of target ions. The apparatus can operate in a relatively poor vacuum in the range of 10.sup.-2 to 10.sup.-3 torr compared with the conventional requirement of 10.sup.-6 to 10.sup.-8 torr while providing precision results with lesser number of electrodes than the conventional mass spectrometer. The separation of the ionic species is achieved through two effects: flight time differentials produced by varying mass/charge ratios of the sample ions; as well as high frequency resonance separation by synchronizing the injection of ions with high frequency electric field applied to an electrode system having equi-potential space and high frequency space. The resulting dispersion in the wide energy spectra of the sample ions serves to accurately identify the sample ions both qualitatively and quantitatively. The spectra dispersion is achieved by modulating the ion beam with application of suitable magnitude and phase angle of the high frequency voltage, and allowing only those ions having the maximum kinetic energy to pass through to a collector electrode. The analyses are based on measurements of the maximum ion current flowing in the collector electrode.

High frequency mass spectrometer

A secondary ion mass spectrometer analyzes secondary ions by separating and detecting positive and negative secondary ions generated from a sample when the sample is irradiated with a high speed primary beam. The sample is irradiated with a primary beam such as a high speed atom beam and secondary ions are emitted from the sample. The emitted secondary ions are separated and detected by a quadrupole mass spectrometer. Downstream of the quadrupole mass spectrometer, a plurality of metallic rod electrodes are provided parallel to each other, some of which are supplied with a positive voltage and the rest of which are supplied with a negative voltage. An electrostatic shield surrounds the metallic rod electrodes. The secondary ions are separated into positive and negative secondary ions by the electric fields formed by the metallic rod electrodes. The separated secondary ions are respectively converted into currents by corresponding secondary electron multipliers or Faraday cups.

Secondary ion mass spectrometer for analyzing positive and negative ions

An exhaust apparatus and a high vacuum pumping unit including a high vacuum device and an auxiliary vacuum pump are disclosed, wherein a high vacuum is achieved in a vacuum vessel such that the gas molecules within the vacuum vessel are ionized and accelerated to be exhausted. In the high vacuum pumping unit, those gas molecules are diffused back or released from the vacuum pump are ionized and accelerated to be returned to the vacuum pump.

Exhaust apparatus with vacuum pump

An ion neutralizer which neutralizes electric charges on ions and produces a fast atom beam in an ultra-high vacuum comprising: an ion source disposed in a vacuum container; a hollow container disposed in the vacuum container, the hollow container being closed at both ends thereof except for an ion beam entrance hole provided in one end portion thereof and a fast atom beam exit hole provided in the other end portion thereof; a metal vapor generating source comprising a filament wound with a fine wire or ribbon of a metal selected from titanium, magnesium and aluminum, the filament being disposed in the hollow container in such a manner as to surround an axis connecting the ion beam entrance hole and the fast atom beam exit hole; a vacuum pump connected to the vacuum container; and a filament heating power supply disposed outside the vacuum container and the hollow container and connected to the filament.

Ion neutralizer

An electron accelerator includes a thermal cathode, heated by infrared rays guided by a quartz rod, for emitting electrons, an accelerating section connected to a high voltage power supply, and a vacuum vessel containing the cathode and the acceleration section. The cathode may be heated by laser beam instead of the infrared rays. The current level of an accelerated electron beam is detected to generate a signal proportional to the detected level. The signal is used to adjust the intensity of the rays heating the cathode to prevent the level of electrons emitted from said cathode from fluctuating.

Electron accelerator

A fast atom beam source used e.g., for sputtering, includes an ion source that emits an ion beam and an electron gun that emits an electron beam at a speed substantially equal to the speed of the ions in the ion beam emitted from the ion source and in the same direction as that of the ion beam. The fast atom beam source may also include a speed control for regulating the speed of the electrons in the electron beam emitted from said electron gun to a level substantially equal to that of the speed of the ions in the ion beam, and a deflector which aligns the electron beam with the ion beam.

Fast atom beam source

A fast atom beam source is capable of emitting a fast atom beam with low energy efficiently and is compact. A reaction gas mixed with a halogen or a halide is introduced into a fast atom beam source casing through a plate-shaped anode, and gas ions that are produced by a plasma discharge induced at a relatively low discharge voltage are converted into a fast atom beam, which is emitted from fast atom beam emitting holes provided in a plate-shaped cathode that is disposed opposite the anode.

A fast atom beam source comprises a evacuated cylinder, an anode set at one end or an intermediate portion of the cylinder, a cathode with fast atom emission orifices on it, and set at the other end of the cylinder, and a DC high voltage power supply for generating gas discharge by applying a high voltage between the anode and the cathode. A slit is provided on inside wall of the cylinder and a reservoir for oil or low-melting point metal is connected to the slit. A heater is set on the resevoir for vapourizing the oil or low-melting point metal. It supplies vapor of oil or low-melting point metal into the cylinder. Many ions of oil or low melting point metal are generated in glow through gas (the oil, vapor or the metal vapor) discharge by high voltage applying. They are accelerated towards the cathode. Then, they are neutralized after collision with the vapor of oil or low-melting point metal remaining near the cathode and are emitted from the orifices on the cathode. They constitute a fast atom beam. During such operation, the vapor of oil or low-melting point metal enters the cylinder through the slit and maintains an equilibrium condition of gas density in the cylinder. Thus, an automatic supply of the gas consumed as a fast atom beam is effected without any gas feeding device or any gas adjusting device.

Growing community of inventors

Tokyo, Japan

Kazutoshi Nagai