Shimadzu Corporation

Keio University

Kazuteru Takahashi

Kiyoshi Ogawa

Koretsugu Ogata

Akiko Kubo

Ryuta Shibutani

Masahito Ueda

Makoto Suematsu

Hideki Sato

Takushi Yamamoto

Shinsuke Inoue

Yusuke Tateishi

Shinji Hamasaki

Kenta Terashima

Hidefumi Yamagata

A sample purification apparatus includes a container for separating, with a heavy solution, a mixed sample based on a specific gravity difference and a collector that collects a component in the mixed sample lighter in specific gravity than the heavy solution by receiving a supernatant flowed out from the container. The container includes a flow-out port provided in an uppermost portion of the container and a flow-out path that guides the supernatant flowed out through the flow-out port to the collector. the container has a horizontal cross-sectional area which gradually decreases upward starting from a prescribed height of the container to a height where the flow-out port is located.

Sample purification apparatus and analysis system

Provided is a sample pretreatment device configured to apply, to the surface of a sample, a solution in which a predetermined substance is dissolved or dispersed. In order to properly and efficiently unclog a nozzle due to the deposition of the crystal of a matrix substance, the device includes a spray unit () including a solution tube () for the solution to pass through, a gas tube () for a spray gas to pass through, and a nozzle part () configured to spray the solution arriving at the terminal end of the solution tube by ejection of the spray gas through the gas tube, as well as a cleaning liquid supplier () configured to put a cleaning liquid on an opening of the nozzle part from outside the spray unit.

Sample pretreatment device

A combined analyzer includes a thermal analyzer, a trap, a gas chromatograph, a mass spectrometer, a first flow path to which a gas generated in the thermal analyzer is supplied, a second flow path that branches from the first flow path and is connected to the mass spectrometer, a third flow path that branches from the first flow path and is connected to the trap, a fourth flow path that connects the trap and a column included in the gas chromatograph, and a fifth flow path that connects the column and the mass spectrometer.

Combined analyzer and analysis method

A system capable of depositing a matrix film containing a low amount of impurities (e.g. neutral particles) is provided. The system includes: a first plate electrodehaving an attachment surface on which a sample plate P is to be attached; a second plate electrodearranged so as to face the attachment surface; a nozzlefor spraying a liquid containing a matrix substance into the space between the two electrodesandby an electrospray method, the nozzlearranged so that none of the electrodesandlies on the central axis A of a spray flow of the liquid; and an electric field creatorfor creating, between the two electrodesand, an electric field for forcing electrically charged droplets contained in the spray flow of the liquid containing the matrix substance to move toward the attachment surface.

Matrix film deposition system

After a sample such as a biomedical tissue section is attached to an electrically-conductive slide glass (S), the film layer of a matrix substance is appropriately formed by vapor deposition so as to cover the sample (S). The crystal of the matrix substance in the film layer is very fine and uniform. Subsequently, the slide glass on which the matrix film layer is formed is placed in a vaporized solvent atmosphere, and the solvent infiltrates into the matrix film layer (S). When the solvent sufficiently infiltrated is vaporized, a substance to be measured in the sample takes in the matrix and re-crystallized. Furthermore, the matrix film layer is formed again on the surface by the vapor deposition (S). The added matrix film layer absorbs excessive energy of a laser beam during MALDI, which suppresses the denaturation of the substance to be measured and the like, so that high detection sensitivity can be achieved while high spatial resolution is maintained.

Sample preparation method and sample preparation device for MALDI including depositing matrix substance on sample substrate in two steps

In an ion sourcein which a repeller electrodefor forming a repelling electric field that repels ions toward an ion emission portis provided inside of an ionization chamberion focusing electrodesandare respectively arranged between an electron introduction portand a filamentand between an electron discharge portand a counter filamentAn electric field formed by applying a predetermined voltage to each of the ion focusing electrodesandintrudes into the ionization chamberthrough the electron introduction portand the electron discharge portand becomes a focusing electric field that pushes the ions in an ion optical axis C direction. Ions at positions off a central part of the ionization chamberreceive the combined force of the force of the repelling electric field and the force of the focusing electric field, and move toward the ion emission portwhile approaching the ion optical axis C. Accordingly, the amount of ions sent out from the ion emission port increases. Further, even if a charge-up phenomenon occurs, the ion trajectories less easily change, and the stability of the sensitivity can be enhanced.

Ionization apparatus

To provide a sample preparation device that is appropriate for the formation of a matrix film for MALDI through vacuum vapor deposition. A sample preparation device is provided with: a sample substrate support unitfor supporting a substance to be analyzed on a substrate S so that the substance faces a vapor deposition sourcefor a matrix substance J; a light amount measurement unit for irradiating a matrix film vapor deposited on the substrate S with measurement light diagonally and detecting the amount of measurement light that has transmitted through or has been reflected from the above-described matrix film diagonally; and an adhesion prevention meansfor preventing the matrix substance that has flown off from the above-described vapor deposition sourcefrom adhering to the above-described light amount measurement unit.

Growing community of inventors

Kyoto, Japan

Kazuteru Takahashi