Micron Technology Incorporated

Kazuteru Ishizuka

Wataru Nobehara

Ryosuke Yatsushiro

Harunobu Kondo

Makoto Saito

Disclosed herein is an apparatus that includes a semiconductor substrate having a main surface extending in a first direction and a second direction different from the first direction and a conductive pattern formed over the main surface of the semiconductor substrate. The conductive pattern includes a first section extending in the first direction, a second section extending in the second direction, and a third section connected between the first and second sections. The third section of the conductive pattern has a first slit extending in a third direction different from the first and second directions.

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Yokohama, Japan

Kazuteru Ishizuka