Toray Industries, Inc.

Kazutaka Tamura

Hiroki Oosedo

Masaya Asano

Shigeyoshi Kanetsuki

Mutsuo Kataoka, Deceased

Hiroyuki Niwa

Masahide Senoo

Mayumi Kataoka, Legal Representative

The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1)(Rand Rare aromatic rings, and Rrepresents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. Rto Rmay be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2)(Rto Rare each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of Rto Ris an aromatic ring with an electron-donating group. Rto Rmay be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.

Positive type radiation-sensitive composition and process for producing pattern with the same

Positive-working radiation-sensitive composition and process for forming a pattern

A developer for quinonediazide/novlak positive electron beam resists including alkali metal ions, weak acid ions and a water soluble organic compound subject to the following conditions: 0.05.ltoreq.a.ltoreq.0.5, 0.07.ltoreq.bn.ltoreq.1.5 and a&lt;bn or a&gt;bn, wherein a is the concentration of the alkali metal in mol/kg, b is the concentration of the weak acid in mol/kg and n is the valence of the weak acid ions, and the concentration of the water soluble organic compound is 0.5 to 10 wt %, based on the total weight of the developer.

Quinonediazide/novolak positive electron beam resist developer

Positive electron beam resist composition containing cresolnovolak

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Otsu, Japan

Kazutaka Tamura