Mitsubishi Gas Chemical Company, Inc.

Kazushige Tanaka

Yasuo Sugihara

Michiya Kawakami

Hisashi Sakaitani

Ikue Sakuma

An acidic or basic hydrogen peroxide cleaning fluid for cleaning a semiconductor substrate, comprising a phosphonic acid chelating agent and a wetting agent, or comprising a wetting agent alone.

Cleaning fluid for semiconductor substrate

A process for purification of hydrogen peroxide is provided which comprises contacting an aqueous hydrogen peroxide solution with a chelate resin. According to the process, it is possible to remove impurities in the aqueous hydrogen peroxide solution in high efficiency, and particularly, it is possible to remove iron, aluminum, etc., which are difficult to remove singly by ion exchange resins, up to extremely low concentrations. Highly pure hydrogen peroxide solutions obtained by this invention can suitably used for washing of silicon wafers.

Growing community of inventors

Tokyo, Japan

Kazushige Tanaka